Inventor
Louis John Markoya
Inventor
Sandy Hook, CT, US
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices62%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
H01LSemiconductor devices7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
G01FMeasuring volume, volume flow, mass flow or liquid level2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
PatentTitleYear
10,908,518Lithographic apparatus and method202110,649,349Lithographic apparatus, a dryer and a method of removing liquid from a surface202010,185,231Lithographic apparatus, a dryer and a method of removing liquid from a surface201910,001,713Lithographic apparatus and method20189,632,425'Lithographic apparatus, a dryer and a method of removing liquid from a surface'20179,330,912'Lithographic apparatus, fluid combining unit and device manufacturing method'20168,817,226'Systems and methods for insitu lens cleaning using ozone in immersion lithography'20148,736,807'Systems and methods for thermally-induced aberration correction in immersion lithography'20148,654,305'Systems and methods for insitu lens cleaning in immersion lithography'20148,629,970'Immersion lithographic apparatus with immersion fluid re-circulating system'20148,451,422'Re-flow and buffer system for immersion lithography'20138,203,693'Liquid immersion lithography system comprising a tilted showerhead relative to a substrate'20128,045,135'Lithographic apparatus with a fluid combining unit and related device manufacturing method'20117,995,185'Systems and methods for thermally-induced aberration correction in immersion lithography'20117,838,310'Tunable alignment geometry'20107,751,030'Interferometric lithographic projection apparatus'20107,684,014'Lithographic apparatus and device manufacturing method'20107,534,637'Tunable alignment geometry'20097,499,146'Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping'20097,492,442'Adjustable resolution interferometric lithography system'20097,474,385'Adjustable resolution interferometric lithography system'20097,256,864'Liquid immersion lithography system having a tilted showerhead relative to a substrate'20077,253,879'Liquid immersion lithography system with tilted liquid flow'20077,112,890'Tunable alignment geometry'20066,967,713'Use of multiple reticles in lithographic printing tools'20056,628,372'Use of multiple reticles in lithographic printing tools'20035,966,215'Line width insensitive wafer target detection in two directions'19995,920,396'Line width insensitive wafer target detection'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2003Based in Shelton, CT, US· patent location history
2005–2021Patents assigned to ASML HOLDING NV (23)· patent assignee history
2005–2021Based in Sandy Hook, CT, US· patent location history
2007–2021Patents assigned to ASML NETHERLANDS BV (12)· patent assignee history
2012–2017Patents assigned to MARKOYA LOUIS JOHN (8)· patent assignee history
2012–2017Patents assigned to SEWELL HARRY (8)· patent assignee history
2013–2017Patents assigned to DONDERS SJOERD NICOLAAS LAMBERTUS (2)· patent assignee history
2013Based in Sandyhook, CT, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML HOLDING NV | 23 | 2005–2021 |
| ASML NETHERLANDS BV | 12 | 2007–2021 |
| MARKOYA LOUIS JOHNself | 8 | 2012–2017 |
| SEWELL HARRY | 8 | 2012–2017 |
| DONDERS SJOERD NICOLAAS LAMBERTUS | 2 | 2013–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sandy Hook, CT, US | 24 | 2005–2021 |
| Shelton, CT, US | 3 | 1999–2003 |
| Sandyhook, CT, US | 1 | 2013 |