LexDanaLexDanabeta
Inventor

Ryoichi Kawamura

Inventor
Shiga, JP

Overview

2→
Patents
1999–2015
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B08Bprimary
B08BCleaning in general25%
B28DWorking stone or stone-like materials25%
G01GWeighing25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
9,091,587'Label printing scale device'20156,006,736'Method and apparatus for washing silicon ingot with water to remove particulate matter'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999Patents assigned to MEMC ELECTRONIC MATERIALS (1)· patent assignee history
1999Based in Mishima, JP· patent location history
2015Patents assigned to AOYAMA KENGO (1)· patent assignee history
2015Patents assigned to ISHIDA SEISAKUSHO (1)· patent assignee history
2015Patents assigned to KAWAMURA RYOICHI (1)· patent assignee history
2015Based in Shiga, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
AOYAMA KENGO12015
ISHIDA SEISAKUSHO12015
KAWAMURA RYOICHIself12015
MEMC ELECTRONIC MATERIALS11999
Locations
LocationPatentsSpan
Shiga, JP12015
Mishima, JP11999