Inventor

Masanori Ikuta

Inventor
Yokkaichi, JP

Overview

7→
Patents
2000–2008
Patent span
Chemistry
Primary field (CPC C)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Dprimary
C07DHeterocyclic compounds17%
Y10TTechnical subjects covered by former us classification14%
G11BInformation storage based on relative movement between record carrier and transducer10%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients7%
C08LCompositions of macromolecular compounds7%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium3%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds3%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2003Patents assigned to KYOWA YUKA KK (5)· patent assignee history
2000–2008Based in Yokkaichi, JP· patent location history
2003Patents assigned to KYOWA HAKKO KOGYO KK (3)· patent assignee history
2003Patents assigned to RICOH KK (3)· patent assignee history
2003Based in Mie, JP· patent location history
2007–2008Patents assigned to KYOWA HAKKO CHEMICAL CO LTD (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KYOWA YUKA KK52000–2003
KYOWA HAKKO KOGYO KK32003
RICOH KK32003
KYOWA HAKKO CHEMICAL CO LTD22007–2008
Locations
LocationPatentsSpan
Yokkaichi, JP62000–2008
Mie, JP12003