LexDanaLexDanabeta
Inventor

Ryo Hayashi

Inventor
Yokohama, JP

Overview

70→
Patents
1995–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 70 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices31%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation10%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution9%
Y02PClimate change mitigation technologies in the production or processing of goods8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
H01LSemiconductor devices6%
H10KOrganic electric solid-state devices5%
G09GArrangements or circuits for control of indicating devices using static means to present variable information4%
H04NPictorial communication, e.g. television4%
C23CCoating metallic material3%
PatentTitleYear
10,714,627Bottom gate type thin film transistor, method of manufacturing the same, and display apparatus202010,604,365Image reading device202010,319,798Light emitting display apparatus20199,911,797'Light emitting display apparatus'20189,905,699'Thin film transistor, method of manufacturing the same, and display apparatus'20189,712,717'Image processing apparatus, region detection method and computer-readable, non-transitory medium'20179,661,166'Image processing apparatus, region detection method and computer-readable, non-transitory medium'20179,645,612'Image-reading apparatus and image-reading auxiliary apparatus'20179,473,653'Image reading apparatus'20169,450,037'Light emitting display apparatus'20169,373,724'Method of driving transistor and device including transistor driven by the method'20169,241,086'Image-reading apparatus'20169,153,635'Light emitting display apparatus'20159,153,703'Thin-film transistor and method of manufacturing same'20159,041,706'Thin film transistor circuit, light emitting display apparatus, and driving method thereof'20158,659,519'Pixel circuit with a writing period and a driving period, and driving method thereof'20148,654,114'Thin film transistor circuit, light emitting display apparatus, and driving method thereof'20148,629,817'Driving circuit of display element and image display apparatus'20148,624,240'Top gate thin film transistor and display apparatus including the same'20148,599,111'Driving circuit of display element and image display apparatus'20138,592,815'Light emitting display apparatus'20138,581,243'Thin-film transistor and process for its fabrication'20138,563,977'Thin film transistor having a two-layer semiconductor with columnar structures, manufacturing method therefor, and display apparatus using the same'20138,530,246'Method for controlling threshold voltage of semiconductor element'20138,525,175'Electronic device having an isolating element and display apparatus including the electronic device'20138,513,662'Semiconductor device and display apparatus'20138,513,661'Thin film transistor having specified transmittance to light'20138,507,910'Active matrix display apparatus'20138,502,217'Oxide semiconductor device including insulating layer and display apparatus using the same'20138,502,222'Amorphous oxide semiconductor, semiconductor device, thin film transistor and display device'20138,487,266'X-ray detector and method for manufacturing the same'20138,445,902'Thin film transistor and method of manufacturing the same'20138,436,349'Thin-film transistor fabrication process and display device'20138,426,243'Amorphous oxide semiconductor and thin film transistor using the same'20138,415,198'Production method of thin film transistor using amorphous oxide semiconductor film'20138,389,996'Method for forming semiconductor film, method for forming semiconductor device and semiconductor device'20138,344,373'Thin film transistor'20138,304,298'Inverter manufacturing method and inverter'20128,216,879'Method for manufacturing semiconductor device or apparatus, and apparatus for manufacturing the same'20128,207,531'Thin film transistor, display device using thin film transistor, and production method of thin film transistor'20128,193,045'Manufacturing method of thin film transistor using oxide semiconductor'20128,154,017'Amorphous oxide semiconductor, semiconductor device, and thin film transistor'20128,148,721'Bottom gate type thin film transistor, method of manufacturing the same, and display apparatus'20128,143,115'Method for manufacturing thin film transistor using oxide semiconductor and display apparatus'20128,129,718'Amorphous oxide semiconductor and thin film transistor using the same'20128,110,436'Method for manufacturing field-effect transistor'20128,088,652'Electron device using oxide semiconductor and method of manufacturing the same'20128,084,331'Method of treating semiconductor element'20118,068,071'Pixel circuit and image display apparatus having the pixel circuit'20118,044,402'Amorphous insulator film and thin-film transistor'20117,923,723'Thin-film transistor and display device using oxide semiconductor'20117,855,379'Electron device using oxide semiconductor and method of manufacturing the same'20107,737,438'Field-effect transistor and method for manufacturing the same'20107,696,513'Light-emitting device using oxide semiconductor thin-film transistor and image display apparatus using the same'20107,411,209'Field-effect transistor and method for manufacturing the same'20087,282,132'Zinc oxide film treatment method and method of manufacturing photovoltaic device utilizing the same'20077,112,264'Plating apparatus and method'20066,858,308'Semiconductor element, and method of forming silicon-based film'20056,855,621'Method of forming silicon-based thin film, method of forming silicon-based semiconductor layer, and photovoltaic element'20056,794,275'Process for forming a silicon-based film on a substrate using a temperature gradient across the substrate axis'20046,737,123'Silicon-based film formation process, silicon-based film, semiconductor device, and silicon-based film formation system'20046,365,308'Light receiving member for electrophotography'20026,331,474'Defect compensation method for semiconductor element'20016,132,817'Method of manufacturing photoelectric transducer with improved ultrasonic and purification steps'20006,054,024'Apparatus for forming transparent conductive film by sputtering and method therefor'20005,720,826'Photovoltaic element and fabrication process thereof'19985,716,480'Photovoltaic device and method of manufacturing the same'19985,563,075'Forming a non-monocrystalline silicone semiconductor having pin junction including laminated intrinsic layers'19965,563,425'Photoelectrical conversion device and generating system using the same'19965,429,685'Photoelectric conversion element and power generation system using the same'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–2020Patents assigned to CANON KK (64)· patent assignee history
1995–2007Based in Nara, JP· patent location history
1998–2000Based in Tsukuba, JP· patent location history
2008–2020Based in Yokohama, JP· patent location history
2011–2016Patents assigned to HAYASHI RYO (35)· patent assignee history
2011–2014Patents assigned to KUMOMI HIDEYA (13)· patent assignee history
2011–2016Patents assigned to ABE KATSUMI (10)· patent assignee history
2012–2015Patents assigned to YABUTA HISATO (12)· patent assignee history
2016–2020Based in Ishikawa, JP· patent location history
2017Based in Kahoku, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK641995–2020
HAYASHI RYOself352011–2016
KUMOMI HIDEYA132011–2014
YABUTA HISATO122012–2015
ABE KATSUMI102011–2016
Locations
LocationPatentsSpan
Yokohama, JP492008–2020
Nara, JP121995–2007
Ishikawa, JP42016–2020
Tsukuba, JP31998–2000
Kahoku, JP22017