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Inventor

CHRISTOPHE DAVID FOUQUET

Inventor
BE

Overview

4→
Patents
2021–2025
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
G01BMeasuring length, thickness or similar linear dimensions27%
G06FElectric digital data processing9%
G06NComputing arrangements based on specific computational models9%
H01LSemiconductor devices9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
PatentTitleYear
12,429,328Metrology method, target and substrate202512,067,340Computational wafer inspection202411,428,521Metrology method, target and substrate202211,204,239Metrology method, target and substrate2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2025Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2021–2025Based in BE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV42021–2025
Locations
LocationPatentsSpan
BE42021–2025