Inventor
Leo L. Linehan
Inventor
Walden, NY, US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds13%
C09DCoating compositions, e.g. paints, varnishes or lacquers10%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes3%
H05KPrinted circuits3%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
6,907,432'Method and system for recycling materials'20056,803,171'Photoimageable composition'20046,610,609'Compatibilization treatment'20036,383,712'Polymer-bound sensitizer'20026,207,787'Antireflective coating for microlithography'20016,136,498'Polymer-bound sensitizer'20006,074,800'Photo acid generator compounds, photo resists, and method for improving bias'20005,736,301'Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used'19985,607,824'Antireflective coating for microlithography'19975,561,194'Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene'19965,547,812'Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer'19965,322,765'Dry developable photoresist compositions and method for use thereof'19945,312,717'Residue free vertical pattern transfer with top surface imaging resists'19945,296,332'Crosslinkable aqueous developable photoresist compositions and method for use thereof'19945,115,090'Viscosity stable, essentially gel-free polyamic acid compositions'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992Patents assigned to HUMMEL JOHN P (1)· patent assignee history
1992Patents assigned to KWONG RANEE W (1)· patent assignee history
1992Patents assigned to LANG ROBERT N (1)· patent assignee history
1992Based in Beacon, NY, US· patent location history
1994–2002Patents assigned to IBM (11)· patent assignee history
1994–2002Based in Walden, NY, US· patent location history
1996–2001Based in Orange County, NY, US· patent location history
2000Based in Marlborough, MA, US· patent location history
2003–2005Patents assigned to SHIPLEY CO LLC (3)· patent assignee history
2003–2005Based in Grafton, MA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 11 | 1994–2002 |
| SHIPLEY CO LLC | 3 | 2003–2005 |
| HUMMEL JOHN P | 1 | 1992 |
| KWONG RANEE W | 1 | 1992 |
| LANG ROBERT N | 1 | 1992 |
Locations
| Location | Patents | Span |
|---|---|---|
| Walden, New York, US | 5 | 1994–2002 |
| Orange County, New York, US | 5 | 1996–2001 |
| Grafton, Massachusetts, US | 3 | 2003–2005 |
| Marlborough, Massachusetts, US | 1 | 2000 |
| Beacon, New York, US | 1 | 1992 |