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Inventor

Eizo Ohya

Inventor
Kumagaya, JP

Overview

2→
Patents
2004–2011
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them33%
PatentTitleYear
7,889,320'Variable slit apparatus, illumination apparatus, exposure apparatus, exposure method, and device fabrication method'20116,727,981'Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2011Patents assigned to NIKON CORP (2)· patent assignee history
2004–2011Based in Kumagaya, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIKON CORP22004–2011
Locations
LocationPatentsSpan
Kumagaya, JP22004–2011