Inventor

Akira Fujimura

Inventor
Saratoga, CA, US

Overview

147→
Patents
1976–2021
Patent span
Physics
Primary field (CPC G)

Patents· 147 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
H01JElectric discharge tubes or discharge lamps15%
G06FElectric digital data processing14%
B82YSpecific uses or applications of nanostructures11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
F02MSupplying combustion engines in general with combustible mixtures or constituents thereof3%
Y02TClimate change mitigation technologies related to transportation3%
Y10TTechnical subjects covered by former us classification3%
B60BVehicle wheels3%
PatentTitleYear
11,062,878Method and system for determining a charged particle beam exposure for a local pattern density202110,884,395Method and system of reducing charged particle beam write time202110,748,744Method and system for determining a charged particle beam exposure for a local pattern density202010,460,071Shaped beam lithography including temperature effects201910,431,422Method and system for dimensional uniformity using charged particle beam lithography201910,317,790Sub-resolution assist features in semiconductor pattern writing201910,290,467Method and system for forming a pattern on a surface using multi-beam charged particle beam lithography201910,101,648Method and system for forming a pattern on a reticle using charged particle beam lithography201810,031,413Method and system for forming patterns using charged particle beam lithography20189,859,100'Method and system for dimensional uniformity using charged particle beam lithography'20189,797,453'Wheel bearing apparatus'20179,715,169'Method and system for forming a pattern on a reticle using charged particle beam lithography'20179,625,809'Method and system for forming patterns using charged particle beam lithography with variable pattern dosage'20179,612,530'Method and system for design of enhanced edge slope patterns for charged particle beam lithography'20179,534,635'Wheel bearing apparatus'20179,465,297'Method and system for forming patterns with charged particle beam lithography'20169,448,473'Method for fracturing and forming a pattern using shaped beam charged particle beam lithography'20169,400,857'Method and system for forming patterns using charged particle beam lithography'20169,372,391'Method and system for forming patterns using charged particle beam lithography with variable pattern dosage'20169,343,267'Method and system for dimensional uniformity using charged particle beam lithography'20169,341,936'Method and system for forming a pattern on a reticle using charged particle beam lithography'20169,323,140'Method and system for forming a pattern on a reticle using charged particle beam lithography'20169,274,412'Method and system for design of a reticle to be manufactured using variable shaped beam lithography'20169,268,214'Method for forming circular patterns on a surface'20169,164,372'Method and system for forming non-manhattan patterns using variable shaped beam lithography'20159,104,109'Method and system for improving critical dimension uniformity using shaped beam lithography'20159,091,946'Method and system for forming non-manhattan patterns using variable shaped beam lithography'20159,057,956'Method and system for design of enhanced edge slope patterns for charged particle beam lithography'20159,043,734'Method and system for forming high accuracy patterns using charged particle beam lithography'20159,038,003'Method and system for critical dimension uniformity using charged particle beam lithography'20159,034,542'Method and system for forming patterns with charged particle beam lithography'20158,959,463'Method and system for dimensional uniformity using charged particle beam lithography'20158,952,546'Integrated circuit designed and manufactured using diagonal minimum-width patterns'20158,916,315'Method for fracturing and forming a pattern using shaped beam charged particle beam lithography'20148,900,778'Method for forming circular patterns on a surface'20148,895,212'Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages'20148,883,375'Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes'20148,852,831'Device for manufacturing a surface using character projection lithography with variable magnification'20148,828,628'Method and system for design of a reticle to be manufactured using variable shaped beam lithography'20148,771,906'Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area'20148,745,874'Method of manufacturing wheel support bearing assembly'20148,745,549'Method and system for forming high precision patterns using charged particle beam lithography'20148,745,555'Method for integrated circuit design and manufacture using diagonal minimum-width patterns'20148,719,739'Method and system for forming patterns using charged particle beam lithography'20148,713,484'Aware manufacturing of integrated circuits'20148,703,389'Method and system for forming patterns with charged particle beam lithography'20148,677,860'Transmission'20148,669,023'Method for optical proximity correction of a reticle to be manufactured using shaped beam lithography'20148,671,378'Method and system for distributing clock signals on non manhattan semiconductor integrated circuits'20148,637,211'Method for integrated circuit manufacturing and mask data preparation using curvilinear patterns'20148,612,901'Method and system for forming patterns using charged particle beam lithography with multiple exposure passes'20138,609,306'Method for forming circular patterns on a surface'20138,592,108'Method for design and manufacture of patterns with variable shaped beam lithography'20138,512,919'Method and system for design of a reticle to be manufactured using variable shaped beam lithography'20138,501,374'Method for fracturing and forming a pattern using shaped beam charged particle beam lithography'20138,492,055'Method and system for fracturing a pattern using lithography with multiple exposure passes'20138,473,875'Method and system for forming high accuracy patterns using charged particle beam lithography'20138,449,197'Bearing apparatus for a wheel of vehicle'20138,438,525'Method and system for distributing clock signals on non Manhattan semiconductor integrated circuits'20138,431,914'Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur'20138,426,832'Cell projection charged particle beam lithography'20138,404,404'Method and system for manufacturing a surface using character projection lithography with variable magnification'20138,354,207'Method, device, and system for forming circular patterns on a surface'20138,343,695'Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography'20138,329,365'Method for design and manufacture of diagonal patterns with variable shaped beam lithography'20128,304,148'Method and system for design of a reticle to be manufactured using variable shaped beam lithography'20128,302,061'Aware manufacturing of an integrated circuit'20128,283,094'Method for fracturing and forming a pattern using circular characters with charged particle beam lithography'20128,263,295'Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithography'20128,240,922'Bearing device for wheel'20128,221,940'Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes'20128,221,004'Method of making wheel support bearing'20128,221,939'Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages'20128,202,673'Method for manufacturing a surface and integrated circuit using variable shaped beam lithography'20128,202,672'Method and system for design of a reticle to be manufactured using variable shaped beam lithography'20128,166,442'Local preferred direction architecture'20128,142,081'Wheel support bearing assembly'20128,137,871'Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area'20128,062,813'Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography'20118,057,970'Method and system for forming circular patterns on a surface'20118,039,176'Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography'20118,017,286'Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography'20118,017,288'Method for fracturing circular patterns and for manufacturing a semiconductor device'20118,020,135'Manufacturing aware design and design aware manufacturing of an integrated circuit'20118,017,289'Method for manufacturing a surface and integrated circuit using variable shaped beam lithography'20117,985,514'Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots'20117,981,575'Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithography'20117,950,858'Bearing apparatus for a wheel of vehicle'20117,914,954'Stencil, stencil design system and method for cell projection particle beam lithography'20117,901,845'Method for optical proximity correction of a reticle to be manufactured using character projection lithography'20117,901,850'Method and system for design of a reticle to be manufactured using variable shaped beam lithography'20117,897,522'Method and system for improving particle beam lithography'20117,883,272'Wheel support bearing assembly'20117,874,734'Wheel support bearing assembly'20117,824,828'Method and system for improvement of dose correction for particle beam writers'20107,799,489'Method for design and manufacture of a reticle using variable shaped beam lithography'20107,772,575'Stencil design and method for cell projection particle beam lithography'20107,759,026'Method and system for manufacturing a reticle using character projection particle beam lithography'20107,759,027'Method and system for design of a reticle to be manufactured using character projection lithography'20107,754,401'Method for manufacturing a surface and integrated circuit using variable shaped beam lithography'20107,748,909'Bearing apparatus for a wheel of vehicle'20107,745,078'Method and system for manufacturing a reticle using character projection lithography'20107,730,441'Method and system for distributing clock signals on non manhattan semiconductor integrated circuit using parameterized rotation'20107,712,064'Manufacturing aware design of integrated circuit layouts'20107,665,900'Vehicle wheel bearing apparatus'20107,644,384'Method and system for distributing clock signals on non-Manhattan semiconductor integrated circuits'20107,635,226'Bearing apparatus for a wheel of vehicle'20097,618,196'Wheel bearing apparatus'20097,579,606'Method and system for logic design for cell projection particle beam lithography'20097,441,220'Local preferred direction architecture, tools, and apparatus'20087,395,516'Manufacturing aware design and design aware manufacturing'20087,263,677'Method and apparatus for creating efficient vias between metal layers in semiconductor designs and layouts'20077,117,470'Method and system for distributing clock signals on non Manhattan semiconductor integrated circuits'20067,086,024'Methods and apparatus for defining power grid structures having diagonal stripes'20066,976,238'Circular vias and interconnect-line ends'20056,900,540'Simulating diagonal wiring directions using Manhattan directional wires'20056,895,569'IC layout with non-quadrilateral Steiner points'20056,870,255'Integrated circuit wiring architectures to support independent designs'20056,858,935'Simulating euclidean wiring directions using manhattan and diagonal directional wires'20056,858,928'Multi-directional wiring on a single metal layer'20056,858,939'Integrated circuit diagonal wiring architectures with zag conductors'20056,225,784'Battery control apparatus for battery carried by hybrid vehicle'20016,204,636'Battery control apparatus for hybrid vehicle'20015,638,795'Control system for internal combustion engines'19975,634,452'Control system for internal combustion engines'19975,619,973'Control system for internal combustion engines'19975,611,320'Control system for internal combustion engines'19975,546,922'Control system for internal combustion engines'19965,469,833'Control system for internal combustion engines'19955,016,596'Air-fuel ratio control method for internal combustion engines'19914,777,924'Fuel supply control method for internal combustion engines after starting'19884,773,378'Fuel supply control method for internal combustion engines after starting in hot state'19884,765,300'Fuel supply control method for internal combustion engines after starting in hot state'19884,753,208'Method for controlling air/fuel ratio of fuel supply system for an internal combustion engine'19884,584,979'Air-fuel ratio control system for an internal combustion engine with a three way catalytic converter'19864,569,318'Secondary intake air supply system for internal combustion engines'19864,495,922'Air/fuel ratio control system for an internal combustion engine'19854,438,627'Exhaust gas purification apparatus in internal combustion engine'19844,436,710'Method of manufacturing potassium sulfate'19844,429,676'Exhaust gas recirculation control system for vehicle engines'19844,391,246'Throttle opener device for vehicle engines'19834,388,994'Flat-article sorting apparatus'19834,349,005'Suction mixture control system for vehicle engines'19824,349,006'Suction mixture control system for vehicle engines'19824,336,784'Exhaust gas recirculation control system for engines'19824,077,373'Ignition timing control device for an internal combustion engine'19783,968,197'Process for treating sodium silico fluoride'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–2014Patents assigned to HONDA MOTOR CO LTD (24)· patent assignee history
1978–2014Based in Wako, JP· patent location history
1982–1984Based in Niiza, JP· patent location history
1984–1986Based in Saitama, JP· patent location history
2005–2014Patents assigned to CADENCE DESIGN SYSTEMS INC (22)· patent assignee history
2005–2021Based in Saratoga, CA, US· patent location history
2009–2021Patents assigned to D2S INC (82)· patent assignee history
2009–2017Patents assigned to NTN TOYO BEARING CO LTD (14)· patent assignee history
2009–2017Based in Iwata, JP· patent location history
2011–2017Patents assigned to FUJIMURA AKIRA (38)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
D2S INC822009–2021
FUJIMURA AKIRAself382011–2017
HONDA MOTOR CO LTD241978–2014
CADENCE DESIGN SYSTEMS INC222005–2014
NTN TOYO BEARING CO LTD142009–2017
Locations
LocationPatentsSpan
Saratoga, California, US1062005–2021
Wako, JP151978–2014
Iwata, JP142009–2017
Niiza, JP51982–1984
Saitama, JP41984–1986