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Inventor

Marinus Jochemsen

Inventor
Veldhoven, NL

Overview

13→
Patents
2013–2021
Patent span
Physics
Primary field (CPC G)

Patents· 13 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices59%
G06FElectric digital data processing9%
G06TImage data processing or generation, in general9%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
G05BControl or regulating systems in general5%
H01LSemiconductor devices5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
Y02PClimate change mitigation technologies in the production or processing of goods5%
PatentTitleYear
11,106,141Optimizing a sequence of processes for manufacturing of product units202111,067,902Computational metrology202111,048,174Method of controlling a patterning process, lithographic apparatus, metrology apparatus lithographic cell and associated computer program202110,962,886Selection of measurement locations for patterning processes202110,859,926Methods for defect validation202010,852,646Displacement based overlay or alignment202010,725,372Method and apparatus for reticle optimization202010,712,672Method of predicting patterning defects caused by overlay error202010,459,345Focus-dose co-optimization based on overlapping process window201910,394,136Metrology method for process window definition20199,964,865Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus20189,329,491'Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus'20168,405,817'Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2021Patents assigned to ASML NETHERLANDS BV (13)· patent assignee history
2013–2016Patents assigned to JOCHEMSEN MARINUS (2)· patent assignee history
2013–2016Patents assigned to KEMPER NICOLAAS RUDOLF (2)· patent assignee history
2013–2016Patents assigned to LI HUA (2)· patent assignee history
2013Patents assigned to BELL FRANCISCUS WILHELMUS (1)· patent assignee history
2013–2021Based in Veldhoven, NL· patent location history
2019Based in Santa Clara, CA, US· patent location history
2021Based in Sunnyvale, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV132013–2021
JOCHEMSEN MARINUSself22013–2016
KEMPER NICOLAAS RUDOLF22013–2016
LI HUA22013–2016
BELL FRANCISCUS WILHELMUS12013
Locations
LocationPatentsSpan
Veldhoven, NL112013–2021
Sunnyvale, California, US12021
Santa Clara, California, US12019