Inventor
Akifumi Ueda
Inventor
Yokohama, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds24%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
B41MPrinting, duplicating, marking, or copying processes8%
H05KPrinted circuits8%
Y10TTechnical subjects covered by former us classification8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
PatentTitleYear
9,625,812'Photosensitive resin composition, photosensitive dry film, pattern formation method, printed circuit board, and method for producing same'20179,188,857'Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon'20158,647,807'Photosensitive resin composition, photosensitive dry film and method for forming pattern'20148,647,806'Photosensitive resin composition, photosensitive dry film and method for forming pattern'20148,614,283'Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer'20138,580,481'Resist polymer and resist composition'20138,476,401'Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon'20138,241,829'Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer'20128,092,979'Resist polymer and resist composition'20128,049,042'Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer'20117,575,846'Resist polymer and resist composition'20095,376,500'Polyester resin for a dye receptive layer of a recording medium for sublimation type heat-sensitive transfer recording process, and a recording medium using the polyester resin'19945,326,741'Recording medium for sublimation type heat-sensitive transfer recording process'19945,326,742'Recording medium for sublimation type heat-sensitive transfer recording process'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2015Patents assigned to MITSUBISHI RAYON CO (13)· patent assignee history
1994Based in Hiroshima, JP· patent location history
2009–2013Based in Kanagawa, JP· patent location history
2011–2015Based in Yokohama, JP· patent location history
2012–2014Patents assigned to UEDA AKIFUMI (7)· patent assignee history
2012–2013Patents assigned to MOMOSE HIKARU (5)· patent assignee history
2012–2013Patents assigned to OOTAKE ATSUSHI (4)· patent assignee history
2014–2017Patents assigned to MICRO PROCESS INC (3)· patent assignee history
2014Based in Toyohashi, JP· patent location history
2017Based in Tsukuba, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI RAYON CO | 13 | 1994–2015 |
| UEDA AKIFUMIself | 7 | 2012–2014 |
| MOMOSE HIKARU | 5 | 2012–2013 |
| OOTAKE ATSUSHI | 4 | 2012–2013 |
| MICRO PROCESS INC | 3 | 2014–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 5 | 2011–2015 |
| Kanagawa, JP | 3 | 2009–2013 |
| Hiroshima, JP | 3 | 1994 |
| Toyohashi, JP | 2 | 2014 |
| Tsukuba, JP | 1 | 2017 |