Inventor
Yousuke Aoki
Inventor
Hitachi, JP
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G03GElectrography25%
H04NPictorial communication, e.g. television25%
Y10TTechnical subjects covered by former us classification25%
PatentTitleYear
8,158,981'Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film'20127,738,143'Copy-forgery-inhibited pattern or stamp image combined with image data based on user actions'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010Patents assigned to CANON KK (1)· patent assignee history
2010Based in Zama, JP· patent location history
2012Patents assigned to ABE KOUICHI (1)· patent assignee history
2012Patents assigned to AOKI YOUSUKE (1)· patent assignee history
2012Patents assigned to HITACHI CHEMICAL CO LTD (1)· patent assignee history
2012Patents assigned to KASUYA KEI (1)· patent assignee history
2012Based in Hitachi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ABE KOUICHI | 1 | 2012 |
| AOKI YOUSUKEself | 1 | 2012 |
| CANON KK | 1 | 2010 |
| HITACHI CHEMICAL CO LTD | 1 | 2012 |
| KASUYA KEI | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hitachi, JP | 1 | 2012 |
| Zama, JP | 1 | 2010 |