Inventor

Kouji Mishima

Inventor

Hitachi, JP

Overview

2014–2021

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary

C09GPolishing compositions19%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%

C09KMaterials for miscellaneous applications, not provided for elsewhere15%

H01LSemiconductor devices15%

C23FNon-mechanical removal of metallic material from surface11%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%

B24BMachines, devices, or processes for grinding or polishing7%

B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems4%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2014–2021Patents assigned to HITACHI CHEMICAL CO LTD (5)· patent assignee history

2014–2018Patents assigned to MISHIMA KOUJI (2)· patent assignee history

2014Patents assigned to FUKASAWA MASATO (1)· patent assignee history

2014Patents assigned to HAGA KOUJI (1)· patent assignee history

2014Patents assigned to NAKAGAWA HIROSHI (1)· patent assignee history

2014–2019Based in Hitachi, JP· patent location history

2021Based in Tokyo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Hitachi, JP	4	2014–2019
Tokyo, JP	1	2021