Inventor
JIAJIE CEN
Inventor
US
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%
C23CCoating metallic material14%
H01JElectric discharge tubes or discharge lamps9%
C01BNon-metallic elements5%
PatentTitleYear
12,575,392Method to deposit metal cap for interconnect202612,543,523Chlorine-free removal of molybdenum oxides from substrates202612,394,619Metal oxide preclean for bottom-up gapfill in MEOL and BEOL202512,191,200Methods for minimizing feature-to-feature gap fill height variations202512,033,846Co-deposition of cesium telluride photocathode and X-ray fluorescence controller co-deposition of cesium telluride photocathode202411,967,525Selective tungsten deposition at low temperatures202411,952,655Electromagnet pulsing effect on PVD step coverage202411,404,313Selective tungsten deposition at low temperatures2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to APPLIED MATERIALS INC (7)· patent assignee history
2022–2026Based in US· patent location history
2024Patents assigned to US DEPT ENERGY (1)· patent assignee history
2024Patents assigned to US ENERGY (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 7 | 2022–2026 |
| US DEPT ENERGY | 1 | 2024 |
| US ENERGY | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 8 | 2022–2026 |