Inventor
Hidehisa Nanai
Inventor
Tokyo, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H01LSemiconductor devices18%
C11DDetergent compositions15%
C09KMaterials for miscellaneous applications, not provided for elsewhere8%
B08BCleaning in general6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
B41MPrinting, duplicating, marking, or copying processes3%
H05KPrinted circuits3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
10,236,175Liquid chemical for forming protecting film20199,748,092'Liquid chemical for forming protecting film'20179,691,603'Chemical for forming protective film'20179,496,131'Liquid chemical for forming protecting film'20169,481,858'Silicon wafer cleaning agent'20169,478,407'Liquid chemical for forming protecting film'20169,281,178'Cleaning agent for silicon wafer'20169,228,120'Liquid chemical for forming protecting film'20169,090,782'Liquid chemical for forming water repellent protective film'20159,053,924'Cleaning agent for silicon wafer'20158,957,005'Silicon wafer cleaning agent'20158,932,390'Liquid chemical for forming protecting film'20158,828,144'Process for cleaning wafers'20148,809,451'Fluorinated dicarboxylic acid derivative and polymer obtained therefrom'20147,333,704'Multichannel optical path changing device and its production method'20086,750,320'Process for producing polyimide platy object'20045,840,369'Polyimide precursor composition, polyimide composition, process for the production of said polyimide precursor composition, and process for the production of said polymide composition'19985,686,525'Polyimide precursor composition and the production of said polyimide precursor composition'19975,478,918'Low stress polyimide composition and precursor composition solution of same'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2019Patents assigned to CENTRAL GLASS CO LTD (18)· patent assignee history
1995–1998Based in Kawagoe, JP· patent location history
2004Based in Saitama, JP· patent location history
2008–2019Based in Tokyo, JP· patent location history
2014–2017Patents assigned to NANAI HIDEHISA (9)· patent assignee history
2014–2017Patents assigned to KUMON SOICHI (8)· patent assignee history
2014–2017Patents assigned to SAIO TAKASHI (8)· patent assignee history
2014–2017Patents assigned to AKAMATSU YOSHINORI (7)· patent assignee history
2014Based in Toshima-ku, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CENTRAL GLASS CO LTD | 18 | 1995–2019 |
| NANAI HIDEHISAself | 9 | 2014–2017 |
| KUMON SOICHI | 8 | 2014–2017 |
| SAIO TAKASHI | 8 | 2014–2017 |
| AKAMATSU YOSHINORI | 7 | 2014–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 14 | 2008–2019 |
| Kawagoe, JP | 3 | 1995–1998 |
| Toshima-ku, JP | 1 | 2014 |
| Saitama, JP | 1 | 2004 |