Inventor
Takashi Nishi
Inventor
Hitachi, JP
Overview
Patents· 35 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G21Fprimary
G21FProtection against x-radiation, gamma radiation, corpuscular radiation or particle bombardment13%
H04NPictorial communication, e.g. television7%
H03MCoding6%
Y10TTechnical subjects covered by former us classification6%
B01DSeparation4%
B22FWorking metallic powder4%
H04LTransmission of digital information, e.g. telegraphic communication4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
E02FDredging2%
F01NGas-flow silencers or exhaust apparatus for machines or engines in general2%
PatentTitleYear
10,767,347Shovel and autonomous aerial vehicle flying around shovel20209,866,854'Apparatus for updating side information on motion video data by different rules between DC and AC components'20189,442,249'Method for processing silicon-based wire optical waveguide'20169,132,713'Suspension of vehicle'20158,850,275'Encoding apparatus, decoding apparatus, and encoding and decoding system'20148,578,709'Over-loading prevention device of construction machinery'20138,392,801'Decoding device and coding system'20138,250,430'Coding system, encoding apparatus and decoding apparatus, with information and parity storage units'20128,230,315'Encoder, decoder, and encoding system'20128,218,652'Image encoder, image decoder, and image encoding system'20128,194,737'Apparatus and method for modifying predicted values, and decoding system'20127,562,886'Installation structure and method of vehicular suspension'20097,315,034'Irradiation system with ion beam/charged particle beam'20087,276,711'Beam space-charge compensation device and ion implantation system having the same'20077,107,668'Method of manufacturing a longitudinal microsolenoid'20067,052,806'Exposure controlling photomask and production method therefor'20066,948,245'Gear and method of making the same'20056,800,196'Method of and apparatus for treating radioactive liquid wastes containing surface active agents'20046,797,972'Neutron shielding materials and a cask for spent fuel'20046,725,528'Microsolenoid coil and its manufacturing method'20046,658,153'Method and decoder for decoding compressed moving-picture data'20036,502,520'Solid material melting apparatus'20036,483,004'Method of treating radioactive liquid wastes containing surface active agents'20025,993,502'Sintered metal filters'19995,925,156'Sintered metal filters'19995,625,861'Porous metal body and process for producing same'19975,534,353'Composite sintered material having fine particles of hard compound dispersed in grains of titanium or titanium alloy matrix'19965,498,828'Solidification agents for radioactive waste and a method for processing radioactive waste'19965,489,737'Radioactive waste processing system'19965,463,171'Method for solidification of waste, and apparatus, waste form, and solidifying material therefor'19955,256,338'Solidifying materials for radioactive waste disposal, structures made of said materials for radioactive waste disposal and process for solidifying of radioactive wastes'19935,202,062'Disposal method of radioactive wastes'19935,114,622'Method of cementing radioactive waste and cemented body'19924,880,595'Process and apparatus for cleaning nuclear reactor cooling water'19894,774,026'Process and apparatus for oxidizing or reducing dissolved substance'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–2004Patents assigned to HITACHI LTD (11)· patent assignee history
1988–1996Based in Hitachi, JP· patent location history
1996–1999Patents assigned to KUBOTA KK (4)· patent assignee history
1997–1999Based in Hirakata, JP· patent location history
2002–2004Based in Hitachinaka, JP· patent location history
2003–2018Patents assigned to OKI ELECTRIC IND CO LTD (8)· patent assignee history
2005–2018Patents assigned to NISHI TAKASHI (11)· patent assignee history
2005–2006Based in Ibaraki-shi, JP· patent location history
2007–2008Patents assigned to SEN CORP AN SHI AND AXCELIS CO (2)· patent assignee history
2012–2018Based in Osaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 11 | 1988–2004 |
| NISHI TAKASHIself | 11 | 2005–2018 |
| OKI ELECTRIC IND CO LTD | 8 | 2003–2018 |
| KUBOTA KK | 4 | 1996–1999 |
| SEN CORP AN SHI AND AXCELIS CO | 2 | 2007–2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hitachi, JP | 8 | 1988–1996 |
| Osaka, JP | 7 | 2012–2018 |
| Ibaraki-shi, JP | 3 | 2005–2006 |
| Hitachinaka, JP | 3 | 2002–2004 |
| Hirakata, JP | 3 | 1997–1999 |