Inventor

Prabhat Kumar

Inventor
Framingham, MA, US

Overview

58→
Patents
1984–2018
Patent span
Electricity
Primary field (CPC H)

Patents· 58 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B22Fprimary
B22FWorking metallic powder12%
C23CCoating metallic material12%
C22CAlloys10%
H01LSemiconductor devices9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
Y10TTechnical subjects covered by former us classification6%
C22BProduction and refining of metals5%
H01GCapacitors4%
H01JElectric discharge tubes or discharge lamps4%
B23KSoldering or unsoldering3%
PatentTitleYear
9,926,623'Methods of forming molybdenum sputtering targets'20189,793,132'Etch mask for hybrid laser scribing and plasma etch wafer singulation process'20179,783,882'Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom'20179,768,014'Wafer coating'20179,601,375'UV-cure pre-treatment of carrier film for wafer dicing using hybrid laser scribing and plasma etch approach'20179,580,773'Niobium based alloy that is resistant to aqueous corrosion'20179,443,765'Water soluble mask formation by dry film vacuum lamination for laser and plasma dicing'20169,412,619'Method of outgassing a mask material deposited over a workpiece in a process tool'20169,355,907'Hybrid wafer dicing approach using a line shaped laser beam profile laser scribing process and plasma etch process'20169,349,648'Hybrid wafer dicing approach using a rectangular shaped two-dimensional top hat laser beam profile or a linear shaped one-dimensional top hat laser beam profile laser scribing process and plasma etch process'20169,309,591'Methods of depositing thin films using molybdenum sputtering targets'20169,312,177'Screen print mask for laser scribe and plasma etch wafer dicing process'20169,187,802'Niobium based alloy that is resistant to aqueous corrosion'20159,159,624'Vacuum lamination of polymeric dry films for wafer dicing using hybrid laser scribing and plasma etch approach'20159,142,459'Wafer dicing using hybrid laser scribing and plasma etch approach with mask application by vacuum lamination'20159,130,057'Hybrid dicing process using a blade and laser'20159,112,050'Dicing tape thermal management by wafer frame support ring cooling during plasma dicing'20159,076,860'Residue removal from singulated die sidewall'20159,040,409'Methods of forming solar cells and solar cell modules'20159,017,600'Methods of forming molybdenum sputtering targets'20158,991,329'Wafer coating'20158,927,393'Water soluble mask formation by dry film vacuum lamination for laser and plasma dicing'20158,911,528'Methods of making molybdenum titanium sputtering plates and targets'20148,883,250'Methods of rejuvenating sputtering targets'20148,859,324'Methods of manufacturing solar cell devices'20148,784,729'High density refractory metals and alloys sputtering targets'20148,491,959'Methods of rejuvenating sputtering targets'20138,425,833'Methods of forming molybdenum sputtering targets'20138,197,894'Methods of forming sputtering targets'20128,088,232'Molybdenum tubular sputtering targets with uniform grain size and texture'20128,043,655'Low-energy method of manufacturing bulk metallic structures with submicron grain sizes'20117,910,051'Low-energy method for fabrication of large-area sputtering targets'20117,850,876'Tin oxide-based sputtering target, transparent and conductive films, method for producing such films and composition for use therein'20107,837,929'Methods of making molybdenum titanium sputtering plates and targets'20107,794,554'Rejuvenation of refractory metal products'20107,754,185'Method of making MoO2 powders, products made from MoO2 powders, deposition of MoO2 thin films, and methods of using such materials'20107,651,658'Refractory metal and alloy refining by laser forming and melting'20107,645,494'Pre-plating surface treatments for enhanced galvanic-corrosion resistance'20107,452,488'Tin oxide-based sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein'20087,416,789'Refractory metal substrate with improved thermal conductivity'20087,368,176'Pre-plating surface treatments for enhanced galvanic-corrosion resistance'20087,056,470'Capacitor-grade lead wires with increased tensile strength and hardness'20066,912,113'Thin film capacitor using conductive polymers'20056,731,495'Thin film capacitor using conductive polymers'20046,593,532'Electrode lead wires'20036,521,173'Low oxygen refractory metal powder for powder metallurgy'20036,358,625'Refractory metals with improved adhesion strength'20026,261,337'Low oxygen refractory metal powder for powder metallurgy'20015,846,287'Consumable electrode method for forming micro-alloyed products'19985,580,516'Powders and products of tantalum, niobium and their alloys'19965,411,611'Consumable electrode method for forming micro-alloyed products'19955,245,514'Extruded capacitor electrode and method of making the same'19935,242,481'Method of making powders and products of tantalum and niobium'19935,171,379'Tantalum base alloys'19924,948,397'Method, means and device for separation of particulate matter from a carrier medium'19904,561,892'Silicon-rich alloy coatings'19854,464,205'Wrought P/M processing for master alloy powder'19844,464,206'Wrought P/M processing for prealloyed powder'1984

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1984–1985Based in Kokomo, IN, US· patent location history
1990–2018Patents assigned to KUMAR PRABHAT (23)· patent assignee history
1992–1998Based in Allentown, PA, US· patent location history
2001Based in Newton, MA, US· patent location history
2002–2018Patents assigned to STARCK H C INC (29)· patent assignee history
2002–2018Based in Framingham, MA, US· patent location history
2014–2017Patents assigned to APPLIED MATERIALS INC (17)· patent assignee history
2014–2017Based in Fremont, CA, US· patent location history
2015–2017Patents assigned to EATON BRAD (10)· patent assignee history
2015–2017Patents assigned to KUMAR AJAY (10)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
STARCK H C INC292002–2018
KUMAR PRABHATself231990–2018
APPLIED MATERIALS INC172014–2017
EATON BRAD102015–2017
KUMAR AJAY102015–2017
Locations
LocationPatentsSpan
Framingham, Massachusetts, US302002–2018
Fremont, California, US172014–2017
Allentown, Pennsylvania, US61992–1998
Kokomo, IN, US31984–1985
Newton, Massachusetts, US12001