LexDanaLexDanabeta
Inventor

Toshihisa Nozawa

Inventor
Amagasaki, JP

Overview

73→
Patents
1992–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 73 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
C23CCoating metallic material15%
H01LSemiconductor devices6%
H05HPlasma technique6%
Y10TTechnical subjects covered by former us classification6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
H10DInorganic electric semiconductor devices2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
F16KValves1%
PatentTitleYear
10,844,489Film forming apparatus and shower head202010,658,181Method of spacer-defined direct patterning in semiconductor fabrication202010,424,462Multi-cell resonator microwave surface-wave plasma apparatus201910,388,557Placing bed structure, treating apparatus using the structure, and method for using the apparatus201910,290,523Wafer processing apparatus, recording medium and wafer conveying method201910,262,865Methods for manufacturing semiconductor devices201910,145,014Film forming apparatus20189,960,033Method of depositing and etching Si-containing film20189,947,516Top dielectric quartz plate and slot antenna concept20189,947,515Microwave surface-wave plasma device20189,896,762'Method of depositing and etching film in one processing apparatus'20189,793,095'Microwave surface-wave plasma device'20179,767,994'Shower plate sintered integrally with gas release hole member and method for manufacturing the same'20179,631,274'Plasma processing apparatus'20179,574,267'Plasma processing apparatus'20179,343,270'Plasma processing apparatus'20169,277,637'Apparatus for plasma treatment and method for plasma treatment'20169,177,846'Placing bed structure, treating apparatus using the structure, and method for using the apparatus'20159,117,764'Etching method, substrate processing method, pattern forming method, method for manufacturing semiconductor element, and semiconductor element'20158,974,628'Plasma treatment device and optical monitor device'20158,973,527'Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatus'20158,968,472'Valve and processing apparatus provided with the same'20158,967,080'Top plate of microwave plasma processing apparatus, plasma processing apparatus and plasma processing method'20158,969,210'Plasma etching apparatus, plasma etching method, and semiconductor device manufacturing method'20158,967,082'Plasma processing apparatus and gas supply device for plasma processing apparatus'20158,925,351'Manufacturing method of top plate of plasma processing apparatus'20158,915,999'Shower plate sintered integrally with gas release hole member and method for manufacturing the same'20148,815,014'Method and system for performing different deposition processes within a single chamber'20148,785,809'Processing device'20148,765,605'Surface treatment for a fluorocarbon film'20148,545,711'Processing method'20138,500,089'Method of operating on-off valve'20138,497,214'Semiconductor device manufacturing method'20138,486,792'Film forming method of silicon oxide film, silicon oxide film, semiconductor device, and manufacturing method of semiconductor device'20138,480,848'Plasma processing apparatus'20138,387,560'Plasma processing unit'20138,383,519'Etching method and recording medium'20138,366,869'Processing apparatus and processing method'20138,343,308'Ceiling plate and plasma process apparatus'20138,323,521'Plasma generation controlled by gravity-induced gas-diffusion separation (GIGDS) techniques'20128,273,210'Plasma processing apparatus and method for adjusting plasma density distribution'20128,267,040'Plasma processing apparatus and plasma processing method'20128,263,174'Light emitting device and method for manufacturing light emitting device'20128,173,928'Processing device'20128,158,012'Film forming apparatus and method for manufacturing light emitting element'20128,124,523'Fabrication method of a semiconductor device and a semiconductor device'20128,123,194'On-off valve and process apparatus employing the on-off valve'20128,110,044'Substrate processing apparatus and temperature control device'20128,091,863'Gate valve and semiconductor manufacturing apparatus'20128,052,887'Substrate processing apparatus'20118,021,975'Plasma processing method for forming a film and an electronic component manufactured by the method'20117,940,009'Plasma processing apparatus'20117,930,992'Plasma processing equipment'20117,895,971'Microwave plasma processing apparatus'20117,874,781'Substrate processing apparatus'20117,828,927'Plasma processing device'20107,779,783'Plasma processing device'20107,754,995'Plasma processing apparatus and plasma processing method'20107,469,654'Plasma processing device'20087,396,431'Plasma processing system for treating a substrate'20087,268,084'Method for treating a substrate'20076,261,428'Magnetron plasma process apparatus'20015,888,846'Method for microfabricating diamond'19995,539,179'Electrostatic chuck having a multilayer structure for attracting an object'19965,290,381'Plasma etching apparatus'19945,271,788'Plasma processing apparatus'19935,255,153'Electrostatic chuck and plasma apparatus equipped therewith'19935,250,137'Plasma treating apparatus'19935,234,527'Liquid level detecting device and a processing apparatus'19935,223,113'Apparatus for forming reduced pressure and for processing object'19935,221,403'Support table for plate-like body and processing apparatus using the table'19935,147,497'Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency wave is applied'19925,115,118'Heat-treatment furnace'1992

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992–2020Patents assigned to TOKYO ELECTRON LTD (67)· patent assignee history
1992–2001Patents assigned to TOSHIBA KK (10)· patent assignee history
1992–1993Based in Yokohama, JP· patent location history
1993–2011Based in Kobe, JP· patent location history
2008–2019Based in Amagasaki, JP· patent location history
2010–2015Based in Hyogo, JP· patent location history
2012–2016Patents assigned to NOZAWA TOSHIHISA (31)· patent assignee history
2012–2015Patents assigned to ISHIBASHI KIYOTAKA (7)· patent assignee history
2012–2015Patents assigned to MATSUOKA TAKAAKI (6)· patent assignee history
2013–2018Based in Sendai, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD671992–2020
NOZAWA TOSHIHISAself312012–2016
TOSHIBA KK101992–2001
ISHIBASHI KIYOTAKA72012–2015
MATSUOKA TAKAAKI62012–2015
Locations
LocationPatentsSpan
Amagasaki, JP282008–2019
Sendai, JP92013–2018
Kobe, JP71993–2011
Yokohama, JP71992–1993
Hyogo, JP62010–2015