Inventor

Eiichi Ogiwara

Inventor
Tokyo, JP

Overview

1→
Patents
2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B23Kprimary
B23KSoldering or unsoldering14%
C03BManufacture, shaping, or supplementary processes14%
C03CChemical composition of glasses, glazes or vitreous enamels14%
C22CAlloys14%
E06BFixed or movable closures for openings in buildings, vehicles, fences or like enclosures in general, e.g. doors, windows, blinds, gates14%
Y02ATechnologies for adaptation to climate change14%
Y02BClimate change mitigation technologies related to buildings, e.g. housing, house appliances or related end-user applications14%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2019Patents assigned to HITACHI CHEMICAL CO LTD (1)· patent assignee history
2019Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI CHEMICAL CO LTD12019
Locations
LocationPatentsSpan
Tokyo, JP12019