Inventor
Shi-Han SHANN
Inventor
TW
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus25%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light25%
H05GX-ray technique25%
PatentTitleYear
12,332,571Target control in extreme ultraviolet lithography systems using aberration of reflection image202511,860,544Target control in extreme ultraviolet lithography systems using aberration of reflection image202411,340,531Target control in extreme ultraviolet lithography systems using aberration of reflection image2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (3)· patent assignee history
2022–2025Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 3 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 3 | 2022–2025 |