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Inventor

Stephen Hensiek

Inventor
Foley, MO, US

Overview

2→
Patents
2001–2002
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
B24BMachines, devices, or processes for grinding or polishing25%
B24CAbrasive or related blasting with particulate material25%
PatentTitleYear
6,479,386'Process for reducing surface variations for polished wafer'20026,227,944'Method for processing a semiconductor wafer'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Patents assigned to MEMC ELECTRONICS MATERIALS INC (1)· patent assignee history
2001–2002Based in Foley, MO, US· patent location history
2002Patents assigned to MEMC ELECTRONIC MATERIALS (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MEMC ELECTRONIC MATERIALS12002
MEMC ELECTRONICS MATERIALS INC12001
Locations
LocationPatentsSpan
Foley, MO, US22001–2002