Inventor
Kevin Golden
Inventor
Wallkill, NY, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices45%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1036%
H10BElectronic memory devices9%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
PatentTitleYear
6,911,091'Environment exchange control for material on a wafer surface'20056,844,027'Environment exchange control for material on a wafer surface'20056,780,461'Environment exchange control for material on a wafer surface'20046,468,586'Environment exchange control for material on a wafer surface'20026,254,936'Environment exchange control for material on a wafer surface'20015,618,751'Method of making single-step trenches using resist fill and recess'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997Patents assigned to IBM (1)· patent assignee history
1997–2005Based in Wallkill, NY, US· patent location history
2001–2002Patents assigned to SILICON VALLEY GROUP (2)· patent assignee history
2004–2005Patents assigned to ASML HOLDING NV (2)· patent assignee history
2005Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML HOLDING NV | 2 | 2004–2005 |
| SILICON VALLEY GROUP | 2 | 2001–2002 |
| ASML NETHERLANDS BV | 1 | 2005 |
| IBM | 1 | 1997 |
Locations
| Location | Patents | Span |
|---|---|---|
| Wallkill, New York, US | 6 | 1997–2005 |