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Inventor

MARTINUS AGNES WILLEM CUIJPERS

Inventor
NL

Overview

1→
Patents
2025
Patent span
Electricity
Primary field (CPC H)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H01LSemiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
12,189,312Reticle gripper damper and isolation system for lithographic apparatuses2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025Patents assigned to ASML HOLDING NV (1)· patent assignee history
2025Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2025Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML HOLDING NV12025
ASML NETHERLANDS BV12025
Locations
LocationPatentsSpan
NL12025