Inventor

Yung-Ho Chuang

Inventor

Cupertino, CA, US

Overview

1985–2021

Patent span

Physics

Primary field (CPC G)

Patents· 142 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary

G01NInvestigating or analysing materials by determining their chemical or physical properties17%

G02BOptical elements, systems or apparatus13%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices12%

H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light9%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein7%

H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation6%

H01LSemiconductor devices6%

H01JElectric discharge tubes or discharge lamps4%

H04NPictorial communication, e.g. television4%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%

PatentTitleYear

11,114,489Back-illuminated sensor and a method of manufacturing a sensor2021 11,114,491Back-illuminated sensor and a method of manufacturing a sensor2021 11,081,310Photocathode including silicon substrate with boron layer2021 11,067,389Overlay metrology system and method2021 11,011,366Broadband ultraviolet illumination sources2021 10,943,760Electron gun and electron microscope2021 10,921,261Strontium tetraborate as optical coating material2021 10,778,925Multiple column per channel CCD sensor architecture for inspection and metrology2020 10,764,527Dual-column-parallel CCD sensor and inspection systems using a sensor2020 10,748,730Photocathode including field emitter array on a silicon substrate with boron layer2020 10,558,123Electron source2020 10,495,582System and method for reducing the bandwidth of a laser and an inspection system and method using a laser2019 10,466,212Scanning electron microscope and methods of inspecting and reviewing samples2019 10,462,391Dark-field inspection using a low-noise sensor2019 10,446,696Back-illuminated sensor with boron layer2019 10,439,355193nm laser and inspection system2019 10,429,719183 nm CW laser and inspection system2019 10,325,004Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology2019 10,313,622Dual-column-parallel CCD sensor and inspection systems using a sensor2019 10,283,366Passivation of nonlinear optical crystals2019 10,269,842Anti-reflection layer for back-illuminated sensor2019 10,199,149183NM laser and inspection system2019 10,197,501Electron-bombarded charge-coupled device and inspection systems using EBCCD detectors2019 10,199,197Photocathode including silicon substrate with boron layer2019 10,193,293Semiconductor inspection and metrology system using laser pulse multiplier2019 10,194,108Sensor with electrically controllable aperture for inspection and metrology systems2019 10,175,555183 nm CW laser and inspection system2019 10,133,181Electron source2018 10,121,914Back-illuminated sensor with boron layer2018 10,044,166CW DUV laser with improved stability2018 10,044,164Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms2018 10,032,619High brightness laser-sustained plasma broadband source2018 9,972,959Semiconductor inspection and metrology system using laser pulse multiplier2018 9,966,230Multi-column electron beam lithography including field emitters on a silicon substrate with boron layer2018 9,935,421193nm laser and inspection system2018 9,891,177'TDI sensor in a darkfield system'2018 9,865,447'High brightness laser-sustained plasma broadband source'2018 9,860,466'Sensor with electrically controllable aperture for inspection and metrology systems'2018 9,818,887'Back-illuminated sensor with boron layer'2017 9,804,101'System and method for reducing the bandwidth of a laser and an inspection system and method using a laser'2017 9,793,673'Semiconductor inspection and metrology system using laser pulse multiplier'2017 9,767,986'Scanning electron microscope and methods of inspecting and reviewing samples'2017 9,768,577'Semiconductor inspection and metrology system using laser pulse multiplier'2017 9,748,729'183NM laser and inspection system'2017 9,748,294'Anti-reflection layer for back-illuminated sensor'2017 9,660,409'Low noise, high stability, deep ultra-violet, continuous wave laser'2017 9,620,547'Image sensor, an inspection system and a method of inspecting an article'2017 9,620,341'Photomultiplier tube, image sensor, and an inspection system using a PMT or image sensor'2017 9,608,399'193 nm laser and an inspection system using a 193 nm laser'2017 9,601,299'Photocathode including silicon substrate with boron layer'2017 9,529,182'193nm laser and inspection system'2016 9,525,265'Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms'2016 9,509,112'CW DUV laser with improved stability'2016 9,496,425'Back-illuminated sensor with boron layer'2016 9,494,531'Multi-spot illumination for improved detection sensitivity'2016 9,478,402'Photomultiplier tube, image sensor, and an inspection system using a PMT or image sensor'2016 9,459,215'Passivation of nonlinear optical crystals'2016 9,462,206'Integrated multi-channel analog front end and digitizer for high speed imaging applications'2016 9,461,435'Alleviation of laser-induced damage in optical materials by suppression of transient color centers formation and control of phonon population'2016 9,448,184'Method and system for determining one or more optical characteristics of structure of a semiconductor wafer'2016 9,426,400'Method and apparatus for high speed acquisition of moving images using pulsed illumination'2016 9,419,407'Laser assembly and inspection system using monolithic bandwidth narrowing apparatus'2016 9,410,901'Image sensor, an inspection system and a method of inspecting an article'2016 9,413,134'Multi-stage ramp-up annealing for frequency-conversion crystals'2016 9,377,414'EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers'2016 9,347,890'Low-noise sensor and an inspection system using a low-noise sensor'2016 9,318,869'193nm laser and inspection system'2016 9,310,296'Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology'2016 9,299,738'Interposer based imaging sensor for high-speed image acquisition and inspection systems'2016 9,293,882'Low noise, high stability, deep ultra-violet, continuous wave laser'2016 9,250,178'Passivation of nonlinear optical crystals'2016 9,151,940'Semiconductor inspection and metrology system using laser pulse multiplier'2015 9,097,683'Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal'2015 9,080,971'Metrology systems and methods'2015 9,080,990'Illumination subsystems of a metrology system, metrology systems, and methods for illuminating a specimen for metrology measurements'2015 9,080,991'Illuminating a specimen for metrology or inspection'2015 9,077,862'TDI sensor modules with localized driving and signal processing circuitry for high speed inspection'2015 9,059,560'Alleviation of laser-induced damage in optical materials by suppression of transient color centers formation and control of phonon population'2015 8,929,406'193NM laser and inspection system'2015 8,873,054'Metrology systems and methods'2014 8,873,596'Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal'2014 8,832,611'Process aware metrology'2014 8,748,828'Interposer based imaging sensor for high-speed image acquisition and inspection systems'2014 8,711,896'Alleviation of laser-induced damage in optical materials by suppression of transient color centers formation and control of phonon population'2014 8,692,986'EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers'2014 8,675,276'Catadioptric imaging system for broad band microscopy'2014 8,675,188'Method and system for determining one or more optical characteristics of structure of a semiconductor wafer'2014 8,643,840'Cell for light source'2014 8,624,971'TDI sensor modules with localized driving and signal processing circuitry for high speed inspection'2014 8,553,217'EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers'2013 8,468,471'Process aware metrology'2013 8,441,639'Metrology systems and methods'2013 7,957,066'Split field inspection system using small catadioptric objectives'2011 7,952,633'Apparatus for continuous clocking of TDI sensors'2011 7,924,892'Fiber amplifier based light source for semiconductor inspection'2011 7,869,121'Small ultra-high NA catadioptric objective using aspheric surfaces'2011 7,817,260'Beam delivery system for laser dark-field illumination in a catadioptric optical system'2010 7,773,296'Ultra-broadband UV microscope imaging system with wide range zoom capability'2010 7,728,968'Excimer laser inspection system'2010 7,679,842'High performance catadioptric imaging system'2010 7,672,043'Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth'2010 7,646,533'Small ultra-high NA catadioptric objective'2010 7,639,419'Inspection system using small catadioptric objective'2009 7,633,675'Catadioptric imaging system employing immersion liquid for use in broad band microscopy'2009 7,627,007'Non-critical phase matching in CLBO to generate sub-213nm wavelengths'2009 7,609,309'Continuous clocking of TDI sensors'2009 7,609,373'Reducing variations in energy reflected from a sample due to thin film interference'2009 7,528,943'Method and apparatus for simultaneous high-speed acquisition of multiple images'2009 7,518,789'Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system'2009 7,502,177'Broad band DUV, VUV long-working distance catadioptric imaging system'2009 7,474,461'Broad band objective having improved lateral color performance'2009 7,465,913'System and method for sensing using adjustable modulation transfer function (MTF) with voltage variations relative to depletion depth at a pixel'2008 7,457,034'High NA system for multiple mode imaging'2008 7,449,673'Peak power and speckle contrast reduction for a single layer pulse'2008 7,423,805'Ultra-broadband UV microscope imaging system with wide range zoom capability'2008 7,345,825'Beam delivery system for laser dark-field illumination in a catadioptric optical system'2008 7,307,783'Catadioptric imaging system employing immersion liquid for use in broad band microscopy'2007 7,245,438'Broad band objective having improved lateral color performance'2007 7,187,500'Peak power and speckle contrast reduction for a single layer pulse'2007 7,180,658'High performance catadioptric imaging system'2007 7,136,234'Broad band DUV, VUV long-working distance catadioptric imaging system'2006 7,136,159'Excimer laser inspection system'2006 7,126,100'System and method for sensing using adjustable modulation transfer function (MTF)'2006 7,035,001'High NA system for multiple mode imaging'2006 6,956,694'Broad spectrum ultraviolet inspection systems employing catadioptric imaging'2005 6,842,298'Broad band DUV, VUV long-working distance catadioptric imaging system'2005 6,801,358'Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system'2004 6,801,357'Ultra-broadband UV microscope imaging system with wide range zoom capability'2004 6,693,930'Peak power and speckle contrast reduction for a single laser pulse'2004 6,560,011'High NA system for multiple mode imaging'2003 6,512,631'Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system'2003 6,483,638'Ultra-broadband UV microscope imaging system with wide range zoom capability'2002 6,392,793'High NA imaging system'2002 6,313,467'Broad spectrum ultraviolet inspection methods employing catadioptric imaging'2001 6,137,570'System and method for analyzing topological features on a surface'2000 6,133,576'Broad spectrum ultraviolet inspection methods employing catadioptric imaging'2000 6,064,517'High NA system for multiple mode imaging'2000 5,999,310'Ultra-broadband UV microscope imaging system with wide range zoom capability'1999 5,956,174'Broad spectrum ultraviolet catadioptric imaging system'1999 5,717,518'Broad spectrum ultraviolet catadioptric imaging system'1998 5,095,487'System for generating pluralities of optical pulses with predetermined frequencies in a temporally and spatially overlapped relationship'1992 4,507,704'Cigarette box with self-lighting device and lighter'1985

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1985Based in Sanchung, TW· patent location history

1992Based in Rochester, NY, US· patent location history

1998–2021Based in Cupertino, CA, US· patent location history

2000–2021Patents assigned to KLA TENCOR CORP (103)· patent assignee history

2004–2011Patents assigned to KLA TENCOR TECH CORP (27)· patent assignee history

2013–2017Patents assigned to CHUANG YUNG-HO (7)· patent assignee history

2013–2015Patents assigned to CHUANG YUNG-HO ALEX (6)· patent assignee history

2019Based in Cupeertino, CA, US· patent location history

2021Patents assigned to KLA CORP (5)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
KLA TENCOR CORP	103	2000–2021
KLA TENCOR TECH CORP	27	2004–2011
CHUANG YUNG-HOself	7	2013–2017
CHUANG YUNG-HO ALEXself	6	2013–2015
KLA CORP	5	2021

Locations

Location	Patents	Span
Cupertino, California, US	139	1998–2021
Cupeertino, California, US	1	2019
Rochester, New York, US	1	1992
Sanchung, TW	1	1985