Inventor
Yasunori Ohno
Inventor
Hitachi, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps54%
H05HPlasma technique23%
C23CCoating metallic material15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
PatentTitleYear
5,266,146'Microwave-powered plasma-generating apparatus and method'19935,133,825'Plasma generating apparatus'19925,085,755'Sputtering apparatus for forming thin films'19925,064,520'Method and apparatus for forming a film'19914,847,476'Ion source device'19894,739,169'Ion source'19884,716,491'High frequency plasma generation apparatus'19874,713,585'Ion source'1987Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1987–1993Patents assigned to HITACHI LTD (8)· patent assignee history
1987–1992Based in Hitachi, JP· patent location history
1991–1993Based in Mito, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 8 | 1987–1993 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hitachi, JP | 5 | 1987–1992 |
| Mito, JP | 3 | 1991–1993 |