Inventor
Shimpei Otaka
Inventor
Yokohama, JP
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B41Jprimary
B41JTypewriters40%
Y10TTechnical subjects covered by former us classification19%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%
C08LCompositions of macromolecular compounds8%
H05KPrinted circuits4%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%
B60LPropulsion of electrically-propelled vehicles2%
H01LSemiconductor devices2%
H02JElectric power networks2%
PatentTitleYear
10,992,181Power transmitting apparatus, power receiving apparatus, control apparatus, and wireless power transfer system202110,457,044Liquid discharge head and liquid discharge head manufacturing method201910,245,831Liquid discharge head, liquid discharge device, and method for manufacturing liquid discharge head20199,776,410'Method of manufacturing liquid discharge head'20179,352,562'Electric connection method'20169,254,661'Liquid ejecting head manufacturing method and liquid ejecting head'20169,150,016'Method of manufacturing liquid ejection head'20159,085,142'Method of manufacturing liquid ejection head, and liquid ejection head'20158,955,223'Method of manufacturing liquid ejection head'20158,714,711'Liquid recording head and method of manufacturing the same'20148,613,862'Method for manufacturing liquid discharge head substrate'20138,597,529'Method for processing substrate and method for producing liquid ejection head and substrate for liquid ejection head'20138,342,655'Liquid jet head and method for manufacturing liquid jet head'20138,210,650'Liquid discharge head'20128,197,705'Method of processing silicon substrate and method of manufacturing liquid discharge head'20128,177,988'Method for manufacturing liquid discharge head'20128,114,305'Method of manufacturing substrate for liquid discharge head'20128,091,234'Manufacturing method for liquid discharge head substrate'20127,947,336'Resin composition, resin cured product, and liquid discharge head'20117,887,162'Resin composition, resin cured product, and liquid discharge head'20117,709,554'Resin composition, resin cured product, and liquid discharge head'20107,687,552'Resin composition, resin cured product, and liquid discharge head'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2019Patents assigned to CANON KK (21)· patent assignee history
2010–2021Based in Yokohama, JP· patent location history
2012–2014Patents assigned to OTAKA SHIMPEI (9)· patent assignee history
2012–2013Patents assigned to HATSUI TAKUYA (6)· patent assignee history
2012–2013Patents assigned to IBE SATOSHI (6)· patent assignee history
2012–2013Patents assigned to KISHIMOTO KEISUKE (6)· patent assignee history
2013–2019Based in Kawasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 21 | 2010–2019 |
| OTAKA SHIMPEIself | 9 | 2012–2014 |
| HATSUI TAKUYA | 6 | 2012–2013 |
| IBE SATOSHI | 6 | 2012–2013 |
| KISHIMOTO KEISUKE | 6 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 11 | 2010–2021 |
| Kawasaki, JP | 11 | 2013–2019 |