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Inventor

Akiko Kobayashi

Inventor
Tokyo, JP

Overview

22→
Patents
1998–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
C23CCoating metallic material17%
H01LSemiconductor devices12%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
A61FFilters implantable into blood vessels3%
A61KPreparations for medical, dental or toiletry purposes3%
A61LMethods or apparatus for sterilising materials or objects in general3%
B82YSpecific uses or applications of nanostructures3%
C12NMicroorganisms or enzymes3%
B41JTypewriters2%
PatentTitleYear
10,910,262Method of selectively depositing a capping layer structure on a semiconductor device structure202110,504,742Method of atomic layer etching using hydrogen plasma201910,378,106Method of forming insulation film by modified PEALD201910,283,353Method of reforming insulating film deposited on substrate with recess pattern201910,258,456Cell-containing sheet201910,219,888Cell-containing sheet20199,944,810Ink composition and ink jet recording method using same20189,793,135'Method of cyclic dry etching using etchant film'20179,478,414'Method for hydrophobization of surface of silicon-containing film by ALD'20168,785,215'Method for repairing damage of dielectric film by cyclic processes'20148,714,800'Light-source device and simulated-solar-light irradiation device provided with same'20148,647,722'Method of forming insulation film using plasma treatment cycles'20148,151,814'Method for controlling flow and concentration of liquid precursor'20127,943,483'Method of manufacturing semiconductor device'20117,531,734'Electronic metronome and method of indicating tempo of electronic metronome'20096,726,954'Method and system for forming copper thin film'20046,562,219'Method for the formation of copper wiring films'20036,407,984'Line failure notifying apparatus for terminal apparatus'20026,143,077'Chemical vapor deposition apparatus'20005,993,679'Method of cleaning metallic films built up within thin film deposition apparatus'19995,991,782'Automated extraction and doubly linked reference marks for partialized document contents and version control'19995,793,479'Thin-film formation device and method'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2004Patents assigned to ANELVA CORP (5)· patent assignee history
1998–2019Based in Tokyo, JP· patent location history
1999–2002Based in Kawasaki, JP· patent location history
2012–2019Patents assigned to KOBAYASHI AKIKO (5)· patent assignee history
2012–2019Patents assigned to SHIMIZU AKIRA (3)· patent assignee history
2012–2014Patents assigned to ASM JAPAN (2)· patent assignee history
2014–2021Patents assigned to ASM IP HOLDING BV (7)· patent assignee history
2014Based in Osaka, JP· patent location history
2018Based in Yokohama, JP· patent location history
2021Based in Inagi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASM IP HOLDING BV72014–2021
ANELVA CORP51998–2004
KOBAYASHI AKIKOself52012–2019
SHIMIZU AKIRA32012–2019
ASM JAPAN22012–2014
Locations
LocationPatentsSpan
Tokyo, JP141998–2019
Kawasaki, JP21999–2002
Inagi, JP12021
Yokohama, JP12018
Osaka, JP12014