Inventor

Harold G. Linde

Inventor

Richmond, VT, US

Overview

40→

Patents

1984–2006

Patent span

Electricity

Primary field (CPC H)

Patents· 40 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%

Y10TTechnical subjects covered by former us classification12%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds9%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%

C09DCoating compositions, e.g. paints, varnishes or lacquers6%

H05KPrinted circuits4%

C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium3%

B24BMachines, devices, or processes for grinding or polishing2%

PatentTitleYear

7,134,933'Wafer thickness control during backside grind'2006 6,963,132'Integrated semiconductor device having co-planar device surfaces'2005 6,887,126'Wafer thickness control during backside grind'2005 6,627,477'Method of assembling a plurality of semiconductor devices having different thickness'2003 6,426,177'Single component developer for use with ghost exposure'2002 6,368,867'Monitor for verification of ozone reaction'2002 6,368,881'Wafer thickness control during backside grind'2002 6,319,884'Method for removal of cured polyimide and other polymers'2001 6,270,949'Single component developer for copolymer resists'2001 6,171,436'Apparatus for removing slurry particles'2001 5,998,569'Environmentally stable optical filter materials'1999 5,972,145'Removable passivating polyimide coating and methods of use'1999 5,947,053'Wear-through detector for multilayered parts and methods of using same'1999 5,896,870'Method of removing slurry particles'1999 5,871,871'Stabilized multi-layered structure of color filters on a silicon chip and a method for making'1999 5,860,211'Method of temporarily bonding two surfaces'1999 5,766,808'Process for forming multilayer lift-off structures'1998 5,716,763'Liquid immersion heating process for substrate temperature uniformity'1998 5,712,078'High contrast photoresists comprising acid sensitive crosslinked polymeric resins'1998 5,641,838'Thermostable coating materials'1997 5,569,731'N,N\' disubstituted perylene diamide'1996 5,565,060'Methods and compositions for the selective etching of silicon'1996 5,539,080'Polyimide and a semiconductor prepared therefrom'1996 5,536,792'Antireflective polymide dielectric for photolithography'1996 5,503,961'Process for forming multilayer lift-off structures'1996 5,451,655'Process for making thermostable coating materials'1995 5,441,797'Antireflective polyimide dielectric for photolithography'1995 5,431,777'Methods and compositions for the selective etching of silicon'1995 5,397,684'Antireflective polyimide dielectric for photolithography'1995 5,194,928'Passivation of metal in metal/polyimide structure'1993 5,153,307'Stabilization of polyamide alkyl ester solutions'1992 5,114,754'Passivation of metal in metal/polyimide structures'1992 5,114,757'Enhancement of polyimide adhesion on reactive metals'1992 5,043,789'Planarizing silsesquioxane copolymer coating'1991 4,978,594'Fluorine-containing base layer for multi-layer resist processes'1990 4,968,552'Versatile reactive ion etch barriers from polyamic acid salts'1990 4,941,941'Method of anisotropically etching silicon wafers and wafer etching solution'1990 4,729,797'Process for removal of cured epoxy'1988 4,590,258'Polyamic acid copolymer system for improved semiconductor manufacturing'1986 4,430,153'Method of forming an RIE etch barrier by in situ conversion of a silicon containing alkyl polyamide/polyimide'1984

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1984–2006Patents assigned to IBM (38)· patent assignee history

1984–2006Based in Richmond, VT, US· patent location history

1992Patents assigned to LINDE HAROLD G (1)· patent assignee history

1992Patents assigned to PREVITI KELLY ROSEMARY A (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
IBM	38	1984–2006
LINDE HAROLD Gself	1	1992
PREVITI KELLY ROSEMARY A	1	1992

Locations

Location	Patents	Span
Richmond, VT, US	40	1984–2006