Inventor

Yoshikazu Banno

Inventor
Ebina, JP

Overview

47→
Patents
1990–2010
Patent span
Electricity
Primary field (CPC H)

Patents· 47 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps80%
B82YSpecific uses or applications of nanostructures11%
G09GArrangements or circuits for control of indicating devices using static means to present variable information4%
B60JWindows, windscreens, non-fixed roofs, doors, or similar devices for vehicles2%
F25CProducing, working or handling ice2%
G03GElectrography2%
PatentTitleYear
7,705,527'Electron-emitting device, electron source, and image-forming apparatus'2010RE040566'Flat panel display including electron emitting device'20087,348,719'Electron-emitting devices provided with a deposit between electroconductive films made of a material different from that of the electroconductive films'2008RE040062'Display device with electron-emitting device with electron-emitting region insulated from electrodes'20087,225,628'Ice making machine'2007RE039633'Display device with electron-emitting device with electron-emitting region insulated from electrodes'20077,021,981'Method for manufacturing electron emission element, electron source, and image forming apparatus'20066,908,356'Electron-emitting device, electron source, and image-forming apparatus'20056,890,231'Electron-emitting device, electron source, and image forming apparatus'20056,802,752'Method of manufacturing electron emitting device'20046,761,925'Electron-emitting device, electron source substrate, electron source, display panel and image-forming apparatus, and production method thereof'20046,593,950'Electron-emitting device, and electron beam-generating apparatus and image-forming apparatus employing the device'20036,511,358'Electron-emitting device, electron source substrate, electron source, display panel and image-forming apparatus, and production method thereof'20036,511,545'Electron-emitting device, electron source substrate, electron source, display panel and image-forming apparatus, and production method thereof'20036,419,746'Electron-emitting device, electron source substrate, electron source, display panel and image-forming apparatus, and production method thereof'20026,390,873'Electron-emitting device, electron source substrate, electron source, display panel and image-forming apparatus, and production method thereof'20026,384,541'Electron-emitting device, electron source, and image-forming apparatus'20026,379,211'Method for manufacturing electron emission element, electron source, and image forming apparatus'20026,344,711'Electron-emitting device'20026,313,815'Electron source and production thereof and image-forming apparatus and production thereof'20016,267,636'Method for manufacturing electron emission element, electron source, and image forming apparatus'20016,169,356'Electron-emitting device, electron source and image-forming apparatus'20016,060,113'Electron-emitting device, electron source substrate, electron source, display panel and image-forming apparatus, and production method thereof'20006,005,333'Electron beam-generating device, and image-forming apparatus and recording apparatus employing the same'19995,872,541'Method for displaying images with electron emitting device'19995,861,227'Methods and manufacturing electron-emitting device, electron source, and image-forming apparatus'19995,853,310'Method of manufacturing electron-emitting device, electron source and image-forming apparatus'19985,759,080'Display device with electron-emitting device with electron-emitting region insulated form electrodes'19985,757,123'Electron-beam generator and image display apparatus making use of it'19985,749,763'Display device with electron-emitting device with electron-emitting region insulted from electrodes'19985,695,236'Glass plate holding device'19975,661,362'Flat panel display including electron emitting device'19975,650,795'Electron source and manufacture method of same, and image forming device and manufacture method of same'19975,645,462'Electron-emitting device, and electron beam-generating apparatus and image-forming apparatus employing the device'19975,605,483'Electron source and production thereof, and image-forming apparatus and production thereof'19975,578,897'Multi-electron source, image-forming device using multi-electron source, and methods for preparing them'19965,576,051'Multiple electron emission device'19965,532,544'Electron-emitting device with electron-emitting region insulated from electrodes'19965,530,314'Electron-emitting device and electron beam-generating apparatus and image-forming apparatus employing the device'19965,525,861'Display apparatus having first and second internal spaces'19965,470,265'Multi-electron source, image-forming device using multi-electron source, and methods for preparing them'19955,285,129'Segmented electron emission device'19945,185,554'Electron-beam generator and image display apparatus making use of it'19935,155,416'Electron beam emitting device and image displaying device by use thereof'19925,066,883'Electron-emitting device with electron-emitting region insulated from electrodes'19915,023,110'Process for producing electron emission device'19914,956,578'Surface conduction electron-emitting device'1990

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1990–2010Patents assigned to CANON KK (45)· patent assignee history
1990–1999Based in Atsugi, JP· patent location history
1995–2004Based in Ebina, JP· patent location history
1997Patents assigned to NIFCO INC (1)· patent assignee history
1998–2008Based in Machida, JP· patent location history
2003–2006Based in Tokyo, JP· patent location history
2005–2010Based in Kanagawa, JP· patent location history
2007Patents assigned to HOSHIZAKI ELECTRIC CO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK451990–2010
HOSHIZAKI ELECTRIC CO LTD12007
NIFCO INC11997
Locations
LocationPatentsSpan
Ebina, JP141995–2004
Atsugi, JP131990–1999
Machida, JP121998–2008
Kanagawa, JP42005–2010
Tokyo, JP22003–2006