Inventor
Tac Huynh
Inventor
Hayward, CA, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1036%
B24BMachines, devices, or processes for grinding or polishing18%
B24DTools for grinding, buffing or sharpening18%
C23CCoating metallic material9%
H01LSemiconductor devices9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
PatentTitleYear
9,793,104'Preparing a semiconductor surface for epitaxial deposition'20176,328,637'Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization'20016,086,460'Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization'20005,822,213'Method and apparatus for determining the center and orientation of a wafer-like object'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2001Patents assigned to LAM RES CORP (3)· patent assignee history
1998Based in Newark, CA, US· patent location history
2000–2001Based in Hayward, CA, US· patent location history
2017Patents assigned to AIXTRON SE (1)· patent assignee history
2017Based in Fremont, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 3 | 1998–2001 |
| AIXTRON SE | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hayward, California, US | 2 | 2000–2001 |
| Fremont, California, US | 1 | 2017 |
| Newark, California, US | 1 | 1998 |