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Inventor

Naoya Hayashi

Inventor
Tokyo, JP

Overview

12→
Patents
1995–2012
Patent span
Physics
Primary field (CPC G)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices35%
H04NPictorial communication, e.g. television24%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
G02BOptical elements, systems or apparatus6%
G06FElectric digital data processing6%
H04JMultiplex communication6%
PatentTitleYear
8,210,565'Airbag cover and airbag device'20127,988,189'Air bag cover and air bag device'20116,868,096'Data multiplexing apparatus having single external memory'20056,780,547'Halftone phase shifting photomask and blanks for halftone phase shifting photomask therefor and a method for forming pattern by using the halftone phase shifting photomask'20046,709,791'Halftone phase shift photomask and blanks for halftone phase shift photomask for it and pattern forming method using this'20046,690,729'Motion vector search apparatus and method'20045,916,712'Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same'19995,738,959'Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layer'19985,725,975'Gradation mask and process for producing the same'19985,717,462'Motion prediction processor and motion prediction apparatus including a plurality of motion prediction processors'19985,699,128'Method and system for bidirectional motion compensation for compression of motion pictures'19975,387,485'Phase shift photomask'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–2004Patents assigned to DAINIPPON PRINTING CO LTD (6)· patent assignee history
1995–2005Based in Tokyo, JP· patent location history
1997–1998Patents assigned to NEC CORP (2)· patent assignee history
2004–2005Patents assigned to NEC ELECTRONICS CORP (2)· patent assignee history
2004Patents assigned to SEMICONDUCTOR LEADING EDGE TEC (2)· patent assignee history
2011–2012Patents assigned to ASHIMORI IND CO LTD (2)· patent assignee history
2011Based in Osaka, JP· patent location history
2012Based in Suita, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DAINIPPON PRINTING CO LTD61995–2004
ASHIMORI IND CO LTD22011–2012
NEC CORP21997–1998
NEC ELECTRONICS CORP22004–2005
SEMICONDUCTOR LEADING EDGE TEC22004
Locations
LocationPatentsSpan
Tokyo, JP101995–2005
Suita, JP12012
Osaka, JP12011