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Inventor

Erik Roelo Loopstra

Inventor
Eindhoven, NL

Overview

1→
Patents
2013
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
8,446,560'Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2013Patents assigned to KEMPEN ANTONIUS THEODORUS WILHELMUS (1)· patent assignee history
2013Patents assigned to KOSTER NORBERTUS BENEDICTUS (1)· patent assignee history
2013Patents assigned to LOOPSTRA ERIK ROELOF (1)· patent assignee history
2013Patents assigned to MOORS JOHANNES HUBERTUS JOSEPHINA (1)· patent assignee history
2013Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV12013
KEMPEN ANTONIUS THEODORUS WILHELMUS12013
KOSTER NORBERTUS BENEDICTUS12013
LOOPSTRA ERIK ROELOFself12013
MOORS JOHANNES HUBERTUS JOSEPHINA12013
Locations
LocationPatentsSpan
Eindhoven, NL12013