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Inventor

HRISHIKESH PATEL

Inventor
NL

Overview

5→
Patents
2022–2026
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices56%
H01LSemiconductor devices11%
H05GX-ray technique11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
Y10TTechnical subjects covered by former us classification11%
PatentTitleYear
12,572,078Radiation source module and lithographic apparatus202612,117,726Pellicle and pellicle assembly202411,754,918Pellicle and pellicle assembly2023RE049297Lithographic apparatus and a device manufacturing method202211,231,646Pellicle and pellicle assembly2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2026Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2022–2026Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV52022–2026
Locations
LocationPatentsSpan
NL52022–2026