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Inventor

Justin Johannes Hermanus Gerritzen

Inventor
Eindhoven, NL

Overview

3→
Patents
2015–2020
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
10,705,426Extraction body for lithographic apparatus202010,656,536Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method20208,988,657'Lithographic apparatus and device manufacturing method'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015–2020Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2015Patents assigned to COUMANS LÉON HUBERT JOSEPH (1)· patent assignee history
2015Patents assigned to EVERS FRANCISCUS JOANNES ANTHONIUS (1)· patent assignee history
2015Patents assigned to GERRITZEN JUSTIN JOHANNES HERMANUS (1)· patent assignee history
2015–2020Based in Eindhoven, NL· patent location history
2020Patents assigned to ASML HOLDING NV (1)· patent assignee history
2020Based in Veldhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32015–2020
ASML HOLDING NV12020
COUMANS LÉON HUBERT JOSEPH12015
EVERS FRANCISCUS JOANNES ANTHONIUS12015
GERRITZEN JUSTIN JOHANNES HERMANUSself12015
Locations
LocationPatentsSpan
Eindhoven, NL22015–2020
Veldhoven, NL12020