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Inventor

Thijs Verhees

Inventor
Veldhoven, NL

Overview

2→
Patents
2019–2020
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
H01JElectric discharge tubes or discharge lamps33%
PatentTitleYear
10,649,347Lithographic apparatus and device manufacturing method202010,409,175Lithographic apparatus and device manufacturing method2019

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2019–2020Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2019–2020Based in Veldhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22019–2020
Locations
LocationPatentsSpan
Veldhoven, NL22019–2020