Inventor
Han Choon Lee
Inventor
Seoul, KR
Overview
Patents· 40 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1020%
H04RLoudspeakers, microphones, gramophone pick-ups or like acoustic electromechanical transducers5%
B81BMicrostructural devices or systems, e.g. micromechanical devices4%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems4%
C23CCoating metallic material4%
H01LSemiconductor devices3%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation3%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
PatentTitleYear
11,082,473Method for complexity reduction in video coding by coding parameters reuse202110,785,557MEMS microphone and method of manufacturing the same202010,785,577MEMS microphone and method of manufacturing the same202010,412,504MEMS microphone and method of manufacturing the same201910,393,689Semiconductor gas sensor and method of manufacturing the same201910,284,962MEMS microphone and method of manufacturing the same201910,241,067Semiconductor gas sensor and method of manufacturing the same201910,158,952MEMS microphone and method of manufacturing the same201810,158,949MEMS microphone and method of manufacturing the same20188,987,034'Backside illumination CMOS image sensor and method of manufacturing the same'20158,760,843'Capacitive device and method for fabricating the same'20147,968,408'MIM capacitor and method of fabricating the same'20117,964,495'Method of manufacturing complementary metal oxide semiconductor image sensor'20117,897,425'Image sensor and method for fabricating the same'20117,880,242'Semiconductor device and method of fabricating the same'20117,858,515'Method for forming metal line in semiconductor device'20107,811,928'Semiconductor devices and fabrication methods thereof'20107,767,580'Semiconductor device and method of fabricating the same'20107,745,348'Manufacturing method of a semiconductor device'20107,692,302'SIP semiconductor device and method for manufacturing the same'20107,682,965'Method for manufacturing semiconductor device'20107,679,192'Semiconductor device including cover layer'20107,674,700'Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device using the same'20107,666,762'Method for fabricating semiconductor device'20107,645,699'Method of forming a diffusion barrier layer using a TaSiN layer and method of forming a metal interconnection line using the same'20107,632,754'Method for forming metal line in a semiconductor device'20097,582,563'Method for fabricating fully silicided gate'20097,531,451'SIP semiconductor device and method for manufacturing the same'20097,498,262'Method of fabricating a thin film and metal wiring in a semiconductor device'20097,482,276'Semiconductor device and method of manufacturing the same'20097,442,639'Method of forming plug of semiconductor device'20087,439,175'Method for fabricating a thin film and metal line of semiconductor device'20087,432,193'Method for fabricating a thin film and a metal line of a semiconductor device'20087,427,561'Method for manufacturing semiconductor device'20087,407,881'Semiconductor device and method for manufacturing the same'20087,307,017'Semiconductor devices and fabrication methods thereof'20077,186,646'Semiconductor devices and methods of forming a barrier metal in semiconductor devices'20077,122,474'Method for forming barrier metal of semiconductor device'20067,037,836'Method of manufacturing a semiconductor device without oxidized copper layer'20066,927,163'Method and apparatus for manufacturing a barrier layer of semiconductor device'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2008Patents assigned to DONGBUANAM SEMICONDUCTOR INC (3)· patent assignee history
2005Based in Daejeon, KR· patent location history
2006–2010Patents assigned to DONGBU ELECTRONICS CO LTD (14)· patent assignee history
2006–2020Based in Seoul, KR· patent location history
2009–2020Patents assigned to DONGBU HITEK CO LTD (19)· patent assignee history
2010–2011Based in Jikok-Dong, KR· patent location history
2010Based in Songpa-gu, KR· patent location history
2011Based in Gangdong-gu, KR· patent location history
2014Patents assigned to CHO JIN YOUN (1)· patent assignee history
2018–2020Patents assigned to DB HITEK CO LTD (7)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DONGBU HITEK CO LTD | 19 | 2009–2020 |
| DONGBU ELECTRONICS CO LTD | 14 | 2006–2010 |
| DB HITEK CO LTD | 7 | 2018–2020 |
| DONGBUANAM SEMICONDUCTOR INC | 3 | 2005–2008 |
| CHO JIN YOUN | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 33 | 2006–2020 |
| Jikok-Dong, KR | 2 | 2010–2011 |
| Songpa-gu, KR | 2 | 2010 |
| Gangdong-gu, KR | 1 | 2011 |
| Daejeon, KR | 1 | 2005 |