Inventor
Junichi Kai
Inventor
Kawasaki, JP
Overview
Patents· 31 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps46%
B82YSpecific uses or applications of nanostructures36%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices1%
PatentTitleYear
6,646,275'Charged particle beam exposure system and method'20036,486,479'Charged particle beam exposure system and method'20026,118,129'Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements'20006,064,807'Charged-particle beam exposure system and method'20006,057,907'Method of and system for exposing pattern on object by charged particle beam'20005,977,548'Charged particle beam exposure system and method'19995,965,895'Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure'19995,920,077'Charged particle beam exposure system'19995,866,300'Method of and system for exposing pattern on object by charged particle beam'19995,841,145'Method of and system for exposing pattern on object by charged particle beam'19985,721,432'Method of and system for charged particle beam exposure'19985,719,402'Method of and system for charged particle beam exposure'19985,631,113'Electron-beam exposure system for reduced distortion of electron beam spot'19975,614,725'Charged particle beam exposure system and method'19975,610,406'Charged particle beam exposure method and apparatus'19975,546,319'Method of and system for charged particle beam exposure'19965,528,048'Charged particle beam exposure system and method'19965,444,257'Electron-beam exposure system for reduced distortion of electron beam spot'19955,434,795'Method of forming pattern having optical angle in charged particle exposure system'19955,399,872'Charged-particle beam exposure method'19955,369,282'Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput'19945,334,846'Correction of charged particle beam exposure deflection by detecting stage position and a position detection mark'19945,329,130'Charged particle beam exposure method and apparatus'19945,260,579'Charged particle beam exposure system and charged particle beam exposure method'19935,225,684'Charged particle beam exposure apparatus control system and a method of operation for providing a drawing start signal'19935,180,920'Method and apparatus for making charged particle beam exposure'19935,134,300'Method and apparatus for controlling charged particle beams in charged particle beam exposure system'19924,980,567'Charged particle beam exposure system using line beams'19904,950,910'Electron beam exposure method and apparatus'19904,586,141'Method and apparatus for an electron beam exposure system'19864,516,030'Scanning electron beam exposure system'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–2003Patents assigned to FUJITSU LTD (31)· patent assignee history
1985–1995Based in Tokyo, JP· patent location history
1993–2003Based in Kawasaki, JP· patent location history
1994–1997Patents assigned to FUJITSU VLSI LTD (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJITSU LTD | 31 | 1985–2003 |
| FUJITSU VLSI LTD | 3 | 1994–1997 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 25 | 1993–2003 |
| Tokyo, JP | 6 | 1985–1995 |