Inventor

Hideho Matsuda

Inventor
Okayama, JP

Overview

4→
Patents
2010–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Jprimary
B01JChemical or physical processes, e.g. catalysis or colloid chemistry36%
C07CAcyclic or carbocyclic compounds36%
C07BGeneral methods of organic chemistry27%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2019Patents assigned to MITSUBISHI GAS CHEMICAL CO (4)· patent assignee history
2010Based in Tokyo, JP· patent location history
2014Patents assigned to MATSUDA HIDEHO (1)· patent assignee history
2014Patents assigned to NOGAMI GENKI (1)· patent assignee history
2014Patents assigned to SHIMA YOSHIKAZU (1)· patent assignee history
2014Patents assigned to SUGANO YUUICHI (1)· patent assignee history
2014Based in Niigata, JP· patent location history
2017–2019Based in Okayama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI GAS CHEMICAL CO42010–2019
MATSUDA HIDEHOself12014
NOGAMI GENKI12014
SHIMA YOSHIKAZU12014
SUGANO YUUICHI12014
Locations
LocationPatentsSpan
Okayama, JP22017–2019
Niigata, JP12014
Tokyo, JP12010