Inventor

Koos VAN BERKEL

Inventor
NL

Overview

6→
Patents
2025–2026
Patent span
Physics
Primary field (CPC G)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
G06FElectric digital data processing8%
G06NComputing arrangements based on specific computational models8%
H01LSemiconductor devices8%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025–2026Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2025–2026Patents assigned to ASML HOLDING NV (2)· patent assignee history
2025–2026Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV62025–2026
ASML HOLDING NV22025–2026
Locations
LocationPatentsSpan
NL62025–2026