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Inventor

Steven H. Johnston

Inventor
Poughkeepsie, NY, US

Overview

4→
Patents
2006–2012
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1044%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1033%
B08BCleaning in general11%
H01JElectric discharge tubes or discharge lamps11%
PatentTitleYear
8,106,485'Chemical oxide removal of plasma damaged SiCOH low k dielectrics'20127,404,874'Method and apparatus for treating wafer edge region with toroidal plasma'20087,368,393'Chemical oxide removal of plasma damaged SiCOH low k dielectrics'20087,129,159'Integrated dual damascene RIE process with organic patterning layer'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2012Patents assigned to IBM (4)· patent assignee history
2006–2012Based in Poughkeepsie, NY, US· patent location history
2012Patents assigned to AMERICA WILLIAM G (1)· patent assignee history
2012Patents assigned to JOHNSTON STEVEN H (1)· patent assignee history
2012Patents assigned to MESSENGER BRIAN W (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM42006–2012
AMERICA WILLIAM G12012
JOHNSTON STEVEN Hself12012
MESSENGER BRIAN W12012
Locations
LocationPatentsSpan
Poughkeepsie, New York, US42006–2012