Inventor
MASAHIRO SAKAI
Inventor
JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices17%
C30BSingle-crystal growth15%
H10HInorganic light-emitting semiconductor devices having potential barriers11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for7%
D03DWoven fabrics7%
D10BIndexing scheme associated with sublasses of section d, relating to textiles7%
D06MTreatment, not provided for elsewhere in class d06, of fibres, threads, yarns, fabrics, feathers or fibrous goods made from such materials4%
D06NWall, floor, or like covering materials, e.g. linoleum, oilcloth, artificial leather, roofing felt, consisting of a fibrous web coated with a layer of macromolecular material4%
H10DInorganic electric semiconductor devices4%
PatentTitleYear
12,564,023Free-standing substrate for epitaxial crystal growth, and functional element202612,481,255Control system, control method, and control program for determining operation data by repeatedly calculating control target data indicating a predicted value of a control target in a plant202512,057,307Group-III element nitride semiconductor substrate202411,982,049Polyester base fabric for airbags202411,862,689Group-III element nitride semiconductor substrate202411,746,446Non-coated airbag base fabric, coated airbag base fabric, and airbag using same202311,611,017Group 13 element nitride layer, free-standing substrate and functional element202311,555,257Group 13 element nitride layer, free-standing substrate and functional element202311,437,233Base substrate, functional element, and method for manufacturing base substrate202211,358,562Airbag base cloth and airbag including same202211,309,455Group 13 element nitride layer, free-standing substrate and functional element202211,245,054Base substrate, functional element, and production method for base substrate2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to NGK INSULATORS LTD (8)· patent assignee history
2022–2024Patents assigned to TOYO BOSEKI (3)· patent assignee history
2022–2026Based in JP· patent location history
2025Patents assigned to ENEOS CORP (1)· patent assignee history
2025Patents assigned to PREFERRED NETWORKS INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NGK INSULATORS LTD | 8 | 2022–2026 |
| TOYO BOSEKI | 3 | 2022–2024 |
| ENEOS CORP | 1 | 2025 |
| PREFERRED NETWORKS INC | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 12 | 2022–2026 |