Inventor
Nikolay Artemiev
Inventor
Berkeley, CA, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties38%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
G01BMeasuring length, thickness or similar linear dimensions15%
G21KHandling of particles or ionising radiation not otherwise provided for15%
H01LSemiconductor devices8%
PatentTitleYear
11,073,487Methods and systems for characterization of an x-ray beam with high spatial resolution202110,859,518X-ray zoom lens for small angle x-ray scatterometry202010,816,486Multilayer targets for calibration and alignment of X-ray based measurement systems202010,481,111Calibration of a small angle X-ray scatterometry based metrology system201910,359,377Beam shaping slit for small spot size transmission small angle X-ray scatterometry2019Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2019–2021Patents assigned to KLA TENCOR CORP (5)· patent assignee history
2019–2021Based in Berkeley, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 5 | 2019–2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Berkeley, California, US | 5 | 2019–2021 |