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Inventor

Scott W. LeFevre

Inventor
Ballston Spa, NY, US

Overview

3→
Patents
2015–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps22%
H01LSemiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
B05DProcesses for applying fluent materials to surfaces, in general11%
C23CCoating metallic material11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
PatentTitleYear
10,580,660Gas phase etching system and method20209,054,050'Method for deep silicon etching using gas pulsing'20158,962,067'Real time process control of the polymer dispersion index'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015–2020Patents assigned to TOKYO ELECTRON LTD (3)· patent assignee history
2015–2020Based in Ballston Spa, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD32015–2020
Locations
LocationPatentsSpan
Ballston Spa, New York, US32015–2020