Inventor
Frank Stietz
Inventor
Lauchheim, DE
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
B08BCleaning in general22%
B82YSpecific uses or applications of nanostructures11%
G02BOptical elements, systems or apparatus11%
G21KHandling of particles or ionising radiation not otherwise provided for11%
Y10TTechnical subjects covered by former us classification11%
PatentTitleYear
7,462,842'Device, EUV lithographic device and method for preventing and cleaning contamination on optical elements'20087,172,788'Optical element and method for its manufacture as well as lithography apparatus and method for manufacturing a semiconductor device'20077,060,993'Device, EUV-lithographic device and method for preventing and cleaning contamination on optical elements'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2008Patents assigned to ZEISS CARL SMT AG (3)· patent assignee history
2006–2008Based in Lauchheim, DE· patent location history
2007Based in Baunatal, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT AG | 3 | 2006–2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Lauchheim, DE | 2 | 2006–2008 |
| Baunatal, DE | 1 | 2007 |