Inventor
Tsuyoshi Narabe
Inventor
Ohmiya, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices70%
G01BMeasuring length, thickness or similar linear dimensions10%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
PatentTitleYear
5,978,094'Alignment device and method based on imaging characteristics of the image pickup system'19995,850,279'Alignment method, projection exposure method, and projection exposure apparatus'19985,798,822'Exposure apparatus'19985,777,722'Scanning exposure apparatus and method'19985,760,881'Exposure apparatus with light shielding portion for plotosensitive elements'19985,625,436'Scanning type exposure apparatus and exposure method'19975,617,211'Exposure apparatus'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–1999Patents assigned to NIKON CORP (7)· patent assignee history
1997–1999Based in Ohmiya, JP· patent location history
1997–1998Based in Omiya, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 7 | 1997–1999 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ohmiya, JP | 5 | 1997–1999 |
| Omiya, JP | 2 | 1997–1998 |