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Inventor

Lodewijk Hubertus Van Os

Inventor
Eindhoven, NL

Overview

1→
Patents
2003
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
6,553,562'Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003Patents assigned to ASM LITHOGRAPHY BV (1)· patent assignee history
2003Patents assigned to ASML MASKTOOLS BV (1)· patent assignee history
2003Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASM LITHOGRAPHY BV12003
ASML MASKTOOLS BV12003
Locations
LocationPatentsSpan
Eindhoven, NL12003