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Inventor

Liwei Wu

Inventor
Shanghai, CN

Overview

6→
Patents
2013–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
H02KDynamo-electric machines30%
F16CShafts10%
F16FSprings10%
H01FMagnets10%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation10%
PatentTitleYear
10,651,717Six-degree-of-freedom linear motor202010,170,972Halbach array and magnetic suspension damper using same20199,755,493'Linear motor and stage apparatus'20179,519,231'Method for measuring and calibrating centroid of coarse stage of photolithography tool'20168,920,031'Split type aerostatic bearing'20148,513,721'CMOS image sensor with non-contact structure'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2016Patents assigned to WU LIWEI (3)· patent assignee history
2013–2020Based in Shanghai, CN· patent location history
2014–2019Patents assigned to SHANGHAI MICROELECTRONICS EQUI (4)· patent assignee history
2014Patents assigned to FANG JIE (1)· patent assignee history
2016Patents assigned to DONG JUNQING (1)· patent assignee history
2019–2020Patents assigned to SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHANGHAI MICROELECTRONICS EQUI42014–2019
WU LIWEIself32013–2016
SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD22019–2020
DONG JUNQING12016
FANG JIE12014
Locations
LocationPatentsSpan
Shanghai, CN62013–2020