Inventor
Stefan Eyring
Inventor
Limburg, DE
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
G01BMeasuring length, thickness or similar linear dimensions17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
G06TImage data processing or generation, in general11%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
G06FElectric digital data processing6%
G06KGraphical data reading6%
H01JElectric discharge tubes or discharge lamps6%
H01LSemiconductor devices6%
PatentTitleYear
10,473,460Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals201910,474,040Systems and methods for device-correlated overlay metrology201910,185,800Apparatus and method for the measurement of pattern placement and size of pattern and computer program therefor20199,704,238'Method for correcting position measurements for optical errors and method for determining mask writer errors'20179,201,312'Method for correcting position measurements for optical errors and method for determining mask writer errors'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2019Patents assigned to KLA TENCOR CORP (5)· patent assignee history
2015–2019Based in Limburg, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 5 | 2015–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Limburg, DE | 5 | 2015–2019 |