Inventor

Tomoko Ishikawa

Inventor
Ibaraki, JP

Overview

8→
Patents
2000–2019
Patent span
Performing operations
Primary field (CPC B)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Gprimary
G03GElectrography25%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry17%
B01DSeparation8%
B22FWorking metallic powder8%
B82YSpecific uses or applications of nanostructures8%
C23CCoating metallic material8%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
H05KPrinted circuits8%
LOC248%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2007Patents assigned to MITSUBISHI CHEM CORP (3)· patent assignee history
2000Based in Yokohama, JP· patent location history
2003–2007Based in Kanagawa, JP· patent location history
2007–2012Patents assigned to NAT INST OF ADVANCED IND SCIEN (2)· patent assignee history
2007–2019Based in Ibaraki, JP· patent location history
2012–2014Patents assigned to ISHIKAWA TOMOKO (2)· patent assignee history
2014–2019Patents assigned to TANAKA PRECIOUS METAL IND (3)· patent assignee history
2014–2017Based in Tsukuba, JP· patent location history
2017Patents assigned to A SCHOOL CORP KANSAI UNIV (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI CHEM CORP32000–2007
TANAKA PRECIOUS METAL IND32014–2019
ISHIKAWA TOMOKOself22012–2014
NAT INST OF ADVANCED IND SCIEN22007–2012
A SCHOOL CORP KANSAI UNIV12017
Locations
LocationPatentsSpan
Ibaraki, JP32007–2019
Tsukuba, JP22014–2017
Kanagawa, JP22003–2007
Yokohama, JP12000