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Inventor

Dmitriy Victorovich Lopaev

Inventor
Moscow, RU

Overview

2→
Patents
2011–2012
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
B82YSpecific uses or applications of nanostructures17%
G21KHandling of particles or ionising radiation not otherwise provided for17%
H05GX-ray technique17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
8,317,929'Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus'20127,872,244'Lithographic apparatus and device manufacturing method'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2012Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2011Based in Tekstilchik, RU· patent location history
2012Patents assigned to BANINE VADIM YEVGENYEVICH (1)· patent assignee history
2012Patents assigned to IVANOV VLADIMIR VITALEVICH (1)· patent assignee history
2012Patents assigned to KOSHELEV KONSTANTIN NIKOLAEVITCH (1)· patent assignee history
2012Patents assigned to KOVALEV ALEKSANDER SERGEEVICH (1)· patent assignee history
2012Based in Moscow, RU· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22011–2012
BANINE VADIM YEVGENYEVICH12012
IVANOV VLADIMIR VITALEVICH12012
KOSHELEV KONSTANTIN NIKOLAEVITCH12012
KOVALEV ALEKSANDER SERGEEVICH12012
Locations
LocationPatentsSpan
Moscow, RU12012
Tekstilchik, RU12011