Inventor
HANS BUTLER
Inventor
NL
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices47%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
H01LSemiconductor devices8%
H02NElectric machines not otherwise provided for8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
G02BOptical elements, systems or apparatus6%
F16FSprings3%
G01DMeasuring not specially adapted for a specific variable3%
G01PMeasuring linear or angular speed, acceleration, deceleration, or shock3%
H01JElectric discharge tubes or discharge lamps3%
PatentTitleYear
12,591,179Metrology apparatus202612,546,379Positioning system, a lithographic apparatus, a driving force attenuation method, and a device manufacturing method202612,306,544Metrology tool with position control of projection system202512,210,294Actuator assemblies comprising piezo actuators or electrostrictive actuators202512,147,167Imprint apparatus with movable stages202411,940,739Metrology apparatus202411,914,308Lithographic apparatus202411,880,144Object table, a stage apparatus and a lithographic apparatus202411,789,373Object positioning system diagnostic and calibration methods positioning control method lithographic apparatus and device manufacturing method202311,609,503Lithographic apparatus202311,561,479Electronic system, accelerometer, calibration method, lithographic apparatus and device manufacturing method202311,543,756Lithographic apparatus and method202311,467,505Height sensor, lithographic apparatus and method for manufacturing devices202211,467,504Piezoelectric actuator, actuator system, substrate support, and lithographic apparatus including the actuator202211,302,512Electron beam inspection apparatus stage positioning202211,269,262Frame assembly, lithographic apparatus and device manufacturing method202211,262,661Metrology apparatus202211,150,560Projection system and mirror and radiation source for a lithographic apparatus2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to ASML NETHERLANDS BV (18)· patent assignee history
2021–2026Based in NL· patent location history
2025Patents assigned to ASML HOLDING NV (1)· patent assignee history
2026Patents assigned to ZEISS CARL SMT GMBH (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 18 | 2021–2026 |
| ASML HOLDING NV | 1 | 2025 |
| ZEISS CARL SMT GMBH | 1 | 2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 18 | 2021–2026 |